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China, Chinese D Type Cavity Single Target DC Magnetron Sputtering Coating Equipment1 Industrial Products Supplier Manufacturer Details, price list catalog:
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Thermal Spray EquipmentPowder Coating MachinePowder Coating
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description D type cavity single target DC magnetron sputtering coater is a laboratory-specific coater with two target positions developed by our company. The equipment is equipped with a DC power supply and can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, etc.Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed, high coating rate, low sample temperature rise, and is a typical high-speed and low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water cooler can effectively take away heat and avoid heat accumulation on the target surface, so that the magnetron coating can work stably for a long time.This model adopts a target-down layout, with the sample table on the top. The height with the target surface can be accurately adjusted through the program, and it can be heated rotatably, with excellent performance.D type cavity single target DC magnetron sputtering coater:Product nameD type cavity single target DC magnetron sputtering coaterProduct modelRJ-MSH500X-I-DC-SSPower supply voltageAC220V,50HzComplete machine power6KWUltimate vacuum degree9x10-4PaSample stageDimensions200mmHeight70mm up and down precise adjustmentHeating temperatureRT-500oCSpeed1-20rpmMagnetron sputtering head parametersQuantity1 4" magnetron sputtering headCooling methodWater cooling, required flow rate 10L/minWater cooler specifications10L/min circulating water chillerVacuum chamberCavity sizeφ500mm X550mm HCavity materialStainless steelObservation windowφ100mmOpening methodFront doorGas flow controller1 mass flow meter is used to control the Ar flow rate, with a range of 200SCCM Ar;Vacuum pumpEquipped with a molecular pump system, with a pumping speed of 1200L/SFilm thickness meterOne quartz vibration film thickness gauge, with a resolution of 0.10 ?Sputtering power supplyOne DC power supply, 500W, suitable for the preparation of metal filmsOperation methodCYKY self-developed professional control systemOverall dimensions1250mm X 1000mm X2000mmOverall weight500kg
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