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China, Chinese Single Target DC Magnetron Sputtering Coater1 Industrial Products Supplier Manufacturer Details, price list catalog:
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Thermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Single target DC magnetron sputtering coater equipment is a cost-effective magnetron sputtering coating equipment independently researched and developed by our company. It has the characteristics of standardization, modularization and customization. Magnetron targets can be selected from 1 inch, 2 inches and 3 inches, and customers can choose according to the size of the plated substrate; The power supply is a 1500W high-power DC power supply, which can be used for high-energy metal sputtering coating. According to experimental requirements, DC or RF power supplies of other specifications can also be selected to achieve coating operations of various materials.The coating instrument has two high-precision mass flow meters, and customers can customize the gas path of up to four mass flow meters if they have other requirements to meet the requirements of complex gas environment construction; The instrument is equipped with an advanced turbomolecular pump set as standard, and the ultimate vacuum can reach 1.0E-5Pa. At the same time, other types of molecular pumps are available for purchase. The molecular pump's gas path is controlled by multiple solenoid valves, which can open the cavity to take out samples without turning off the pump, which greatly improves your work efficiency. This product can be equipped with an integrated industrial control computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve the efficiency of your experiment. Application scope of single target magnetron sputtering coater: Single target DC magnetron sputtering coater can be used to prepare single-layer ferroelectric films, conductive films, alloy films, etc. Compared with similar equipment, this single-target magnetron sputtering coating instrument is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material thin films, and is especially suitable for laboratory research on solid electrolytes and OLED etc.Technical parameters of single target magnetron sputtering coater:Single target DC magnetron sputtering coating instrumentSample stageDimensionsφ185mmHeating rangeRoom temperature~500oCAdjustable speed1-20rpm adjustablemagnetic control target gunTarget planeCircular plane targetSputtering vacuum10Pa~0.2PaTarget diameter50~50.8mmTarget thickness2~5mmInsulation voltage>2000VCable specificationsSL-16Target head temperature<=65oCreal null Cavity bodyInner wall treatmentElectrolytic polishingCavity sizeφ300mm × 300mmCavity material304 stainless steelObservation windowQuartz window, diameter φ100mmOpen methodTop opening, cylinder auxiliary supportgas body control systemFlow controlMass flow meter, range 0~200SCCM argon gasControl valve typeSolenoid valveControl valve static stateNormally closedMeasuring linearity±1.5%F.SMeasurement repeatability±0.2%F.SMeasuring response time≤8 second(T95)Working pressure range0.3MPaValve body pressure3MPaWorking temperature(5~45)oCBody materialStainless steel 316LValve body leakage rate1×10-8Pa.m3/sPipe joints1/4″Compression fittingInput and output signal0~5VPower supply±15V(±5%)(+15V 50mA, -15V 200mA)Overall dimensions mm130 (width) × 102 (height) × 28 (thickness)Communication InterfaceRS485 MODBUS protocolDC power supplyPower500WOutput voltage0~600VTiming length65000 secondStart Time1~10 secondFilm thickness measurementPower requirementsDC:5V(±10%) Maximum current 400mAResolution±0.03Hz(5-6MHz),0.0136? / Measurement (aluminum)Measurement accuracy±0.5% thickness + 1 countMeasurement period100mS~1S/time (can be set)Measuring range500,000 ? (aluminum)Crystal frequency6MHzCommunication Interface RS-232/485 serial interfaceDisplay digits8-digit LED displayMolecular pumpMolecular pump pumping speed80L/SRated speed65000rpmVibration value<=0.1umStart Time<=4.5minDowntime<7minCooling methodAir-cooled Cooling water temperature<=37oCCooling water flow rate1L/minInstallation directionVertical ±5°Suction port150CFExhaust connectionKF40Fore pumpPumping rate1.1L/S(VRD-4)Ultimate vacuum5×10-2PaPower supplyAC:220V/50HzPower400WNoise<=56dbSuction portKF40Exhaust connectionKF25Release valvePneumatic and electronically controlled air release valve is installed on the vacuum chamberThe ultimate vacuum of the whole machine<=5×10-4PaVacuum chamber boost rate<=2.5Pa/hSoftware system1 set of monitoring and management softwareTest target2 copper targets with a diameter of 2 inches and a thickness of 3 mm
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