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China, Chinese Lab Desktop Single-Target Magnetron Coater with Bias Voltage1 Industrial Products Supplier Manufacturer Details, price list catalog:
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HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description This equipment is a single-target magnetron sputtering coater instrument, which can be used for the preparation of general metal thin films. At the same time, the equipment is equipped with a bias power supply, which can be used for plasma cleaning before sputtering and exerting bias during sputtering. single-target magnetron sputtering coater Structure setting:This single-target magnetron sputtering coater is equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, intuitive operation interface, easy to get started.single-target magnetron sputtering coater technical parameter: Product NameDesktop single-target magnetron coater with bias voltageProduct ModelRJ-MSZ180-1-DC-Q (Bias voltage)Installation Condition1,Working environment temperature: 25oC±15oC,humidity: 55%Rh±10%Rh;2,Equipment power supply:AC220V,50Hz, must be well grounded;3,Rated power:1000w;4,Equipment for gas:The equipment chamber should be filled with argon gas for cleaning. The customer should prepare argon gas with purity ≥99.99%.5,Table size requirements: 600mm×600mm×850mm,bearing capacity ≥ 50kg;6,The position should be well ventilated and cooled.Technical Indicators1, Sputtering power supply:DC power supply 300W;maximum output voltage 600V,limited current output 500mA2, Magnetron target:2 inch balance target,magnetic coupling baffle;3, Bias power supply: output voltage <1000V, type: high-frequency pulse DC power supply 4, Suitable target material: φ50mm x 3mm in thickness5, Cavity size :outside diameter194,inside diameter186mm x height 230mm6, Cavity material: 304 stainless steel7, Rotating heating sample table:rotate speed 1~20rpm continuously adjustable;maximum heating temperature 500oC,the lowest recommended heating rate 10oC/min,the highest recommended heating rate 20oC/min.8, Cooling mode :magnetic target and molecular pump require circulating water cooler9, Water-cooling machine:the tank volume 9L,flow rate 10L/min10, Gas supply system:mass flow meter, type of gas Argon,flow 1~30sccm(customizable)11, Accuracy of flow meter :±1.5% measuring range12, The air pumping interface of the vacuum chamber is KF2513, Air intake interface is 1/4 inch double ferrule joint14, Touch screen is 7inch color touch screen15, Adjustable sputtering current,sputtering safety current value and safety vacuum value can be set;16, safety protection: over current, vacuum is too low automatically cut off the sputtering current17, Ultimate vacuum:5E-4Pa(matching molecular pump);18, Vacuum measurement is Parana vacuum gauge ,the range is:1~105PaNotice1,Magnetron sputtering has a high working vacuum, generally within 2Pa, and needs to be used with molecular pump. 2,In order to achieve a high oxygen free environment, the vacuum chamber should be cleaned at least 3 times with high purity inert gas.3,Magnetron sputtering is sensitive to the air intake, so mass flow meter is needed to control the air intakeOptional AccessoryFilm thickness monitor1,Film thickness resolution:0.0136?(aluminum)2,Accuracy of film thickness :±0.5%,it depends on process conditions, especially sensor position, material stress, temperature and density 3,Measuring speed:100ms-1s/times,measurement range can be set :500000?(aluminum)4,Standard sensor crystal:6MHz5,Suitable for wafer frequency:6MHz suitable for wafer size:Φ14mmmounting flange:CF35Another accessory· 1, series high performance molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~105Pa) series small molecular pump set(including composite vacuum gauge, measuring range 10-5Pa~102Pa)VRD-4 bipolar rotary vane vacuum pump2,KF25 Vacuum bellows; The length can be 0.5m, 1m or 1.5m. KF40 clamp bracket3,Film thickness meter crystal oscillator;
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