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China, Chinese Lab Three Target Magnetron Sputtering Coating Machine DC Power Supply RF Power Supply1 Industrial Products Supplier Manufacturer Details, price list catalog:
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Thermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Three target magnetron sputtering coating instrument is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The equipment can be used to prepare single-layer or multi-layer ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, polytetrafluoroethylene films, etc. DC power supply can be used for the preparation of metal films, RF power supply can be used for the preparation of non-metallic films, and the three targets can meet the needs of multi-layer or multiple coating. Compared with similar equipment, the three-target magnetron sputtering coating instrument is not only widely used, but also has the advantages of small volume and easy operation. It is an ideal equipment for preparing material films in the laboratory. magnetron sputtering coating technical parameters :Three target magnetron sputtering coating machine (DC power supply + RF power supply)Sample tableSputtering modeSputtering orientation upwards, the sample stage is located above the sputtering target;Center top setting sample holder, with one shutterSample holderφ150mmControl accuracy±1oCHeating rangeRoom temperature~500oCAdjustable speed1-20rpm adjustableTarget base distance adjustableThe distance between the target and the substrate can be adjusted electrically Magnetron target gunTarget planeCircular plane targetSputtering vacuum10Pa~0.2PaTarget diameter50~50.8mmTarget thickness2~5mmNote: if the target is magnetic material (such as Fe, Co, Ni), the thickness cannot be more than 1.5mm, and strong magnetic sputtering gun is required, will need extra charge.Insulation voltage>2000VQuantity2 inches*3;with shutters for each gunCable specificationSL-16Target head temperature<=65oC Vacuum chamberInner wall treatmentElectrolytic polishingChamber sizeφ300mm × 350mmChamber material304 stainless steelObservation windowQuartz window, diameter φ100mm with shutterSealing methodViton sealOpen methodTop opening, cylinder auxiliary support Gas control systemFlow control3-way mass flow meter:Oxygen: range 0~100SCCMArgon gas: range 0~200SCCMNitrogen: range 0~500SCCM(Note: In order to achieve a higher oxygen-free environment, the vacuum chamber must be cleaned with high-purity inert gas at least 3 times.)Gas typeArgon, nitrogen, oxygen, and other inert gasesControl valve typeSolenoid valveControl valve static stateNormally closedMeasuring linearity±1.5% F.SMeasurement repeatability±0.2% F.SMeasuring response time≤8 seconds(T95)Working pressure range0.3MPaValve body pressure3MPaWorking temperature(5~45)oCBody materialStainless steel 316LValve body leakage rate1×10-8Pa.m3/sPipe joints1/4″Compression fittingInput and output signal0~5VPower supply±15V(±5%)(+15V 50mA, -15V 200mA)Overall dimensions (mm)130 (width) × 102 (height) × 28 (thickness)Communication InterfaceRS485 MODBUS protocolDC power supplyPower supply500WOutput voltage0~600VMaximum output current1ATiming length65000 SStarting time1~10 SQuantity2 setsRF power supplyPower supply500WPower output range0W-500W, with auto matchMaximum reflected power100WRF frequency13.56MHz+/-0.005% stabilityPower stability≤5WHarmonic componentless than -50dbcQuantity1 set
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