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China, Chinese Desktop Double Target Magnetron Sputtering Vacuum Coating Machine with Stainless Steel Cavity for Cr Deposition on Wafer Coating1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Thermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description This equipment is a double target magnetron sputtering coater,it can be used in the preparation of metal film,and also used in electronic fields,optical fields,special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory.This set is double target magnetron sputtering coater equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, and intuitive operation interface, easy to get started. Technical Parameters:product nameDesktop stainless steel cavity double target magnetron sputtering coating apparatusProduct numberRJ-MSZ254-I I -DC-SSsample stage Dimensionsφ100mmHeating temperature<=500oCAdjustable speed<=20rpmMagnetic target gunEquipped with a two-inch magnetic control target, target size: diameter 50.8mm, thickness <=3mmvacuum chamber Cavity sizeφ254mm X 300mmobservation windowomnidirectionally transparentCavity material304 stainless steelOpening methodTop cover and front doorVacuum system Backing pumpLow noise bipolar rotary vane pumpMolecular pumpLow noise and high pumping speed turbomolecular pumpVacuum measurementComposite vacuum gauge, range: 10-5~105PaAir extraction interfaceKF16Exhaust interfaceKF16System vacuum1.0×10-4PaPower supplyAC 220V 50/60HzPumping rateThe pumping speed of the molecular pump is 600L/s, and the pumping speed of the backing pump is 1.1L/s.Power configuration Number of power suppliesA set of DC power supplyOutput PowerDC power supply 500WOther parametersSupply voltageAC220V,50HzTotal power2kWOverall size550mm X 350mm X450mm
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