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China, Chinese Lab High Vacuum 4-Inch Three-Target Magnetron Sputtering Coater for Silicon Carbide Film1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Thermal Spray EquipmentPVD Coating MachineMachine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description The three-target magnetron sputtering coater can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, etc. Compared with similar equipment, the three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for preparing material thin films in the laboratory. The three-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company, which has the characteristics of standardization, modularization and customization. The magnetron target is 4 inches, and customers can choose it according to the size of the substrate to be plated; the power supply is three 500W RF power supplies, which can be used for the preparation of non-metallic thin films, and the three targets can meet the needs of multi-layer or multiple coatings. The coater has a high-precision mass flowmeter. If the customer has other needs, the gas path of up to four mass flowmeters can be customized to meet the needs of complex gas environment construction; the instrument is equipped with an advanced turbomolecular pump group, and the ultimate vacuum can reach 1.0E-4Pa. At the same time, other types of molecular pumps are available for purchase. The gas path of the molecular pump is controlled by multiple solenoid valves, which can realize the opening of the cavity to take out the sample without turning off the pump, greatly improving your work efficiency. This product can be equipped with an all-in-one industrial computer to control the system. The computer program can realize most functions such as the control of the vacuum pump group and the control of the sputtering power supply, which can further improve your experimental efficiency.Technical parameters:Product NameTriple Target Magnetron Sputtering CoaterModelRJ-MSH1000-III-RFRFRF-SSSample StageSize632*750Rotational speed1-20rpm adjustableMagnetron Sputtering TargetQuantity4"×3Cooling modeWater coolingWater chillerCirculating water chiller with flow rate of 10L/minVacuum ChamberChamber sizeDia.1000mm*800mmChamber materialStainless steelWatch windowDia.100mmOpening modeFront door openMass Flow MeterSingle channel, 0-200SCCM for ArVacuum SystemBacking pumpRotary vane pump, 8.3L/sSecondary pumpMolecular pump, 300L/sUltimate vacuum1.0E-3PaPumping interfaceISO160Exhaust interfaceK16FVacuum measurementCompound vacuum gaugePower supplyAC220V, 50/60HzRF Power SupplyQuantityRF power supply*3Max output power0-500WOther parametersSupply voltageAC220V,50HzTotal power8KWOverall size2020*1785*1860mmTotal WeightAbout 500kg
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