IPDB › China Industry › Manufacturing & Processing Machinery
China, Chinese Double-Head Magnetron Sputtering Coater with Bias Power Supply1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Thermal Spray EquipmentPowder Coating MachinePowder Coating
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
Preview:
Product Description Double target magnetron sputtering coater is a small laboratory coater with two targets developed by our company. this magnetron sputtering coater can be used to prepare single or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical film, etc.Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy, high speed, high coating rate and low sample temperature rise, which is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled inter layer, the water cooler can effectively take away heat, avoid heat gathering on the target surface, and make the magnetron coating work stably for a long time.In addition, the device is also equipped with bias power supply, which can add bias electric field between the target and the sample platform, enhance the energy of ions, improve the film quality and adhesion of the film. The whole machine adopts touch screen control, one key coating procedure, simple operation, and is an ideal equipment for preparing thin film in the laboratory.Technical Parameters of Double target magnetron sputtering coater:product nameDouble target magnetron sputtering coaterProduct numberRJ-MSV300- II-DCRF-SSItemDetailVoltageAC220V,50HzPower3KWUltimate vacuum10-6 torrSample stage Size:dia.150mm Heating temperature:MAX.500oClAccuracy:±1oC Speed:1~20rpm adjustableMagnetron sputtering headNumber: two ,2-inchCooling mode: Water cooling,10L / min flow rateVacuum ChamberSize:dia.300mm × 300mm HMaterial:stainless steelObservation window:dia.100mmOpening mode:Open top, easy to replace the targetGas flow controller2 channels: Ar, N2;Range 0-100sccmVacuum pumpMolecular pump system, pumping speed: 600L/SFilm thickness gaugeQuartz vibrating film thickness gauge, resolution: 0.10 μMSputtering power supplyOne DC power supply, 1000W, suitable for preparing metal filmOne RF power supply, 500W, suitable for non-metallic coatingOperation modePanel button operationDimensions1400mm × 750mm × 1300mmWeight300 KGDisclaimer: The product introduction content (including product images, product descriptions, technical parameters, etc.) of this site is for reference only. As the update may not be timely, there will be some differences between the content and the actual situation. Please contact our sales staff to confirm. The information provided on this site does not constitute any offer or promise, and the company will periodically improve and modify the website information, without prior notice, please understand.
Purchasing Request
Note: Send your purchase request, and we will screen suppliers or manufacturers for you free of charge...