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China, Chinese Split Type High Vacuum Dual-Target Magnetron Sputtering Coating Machine for Ferroelectric Thin Films1 Industrial Products Supplier Manufacturer Details, price list catalog:
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Thermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description The dual-target magnetron sputtering coating machine is a cost-effective magnetron sputtering coating equipment independently developed by our company, featuring standardization, modularization, and customizability. The magnetron targets are available in 1-inch and 2-inch options, allowing customers to choose based on the size of the substrate to be coated. Equipped with two 500W DC power supplies, this machine is suitable for preparing metal films, and the two targets cater to the needs of multi-layer or multiple coating processes.The coating machine is equipped with two high-precision mass flow controllers, and customers can customize up to four MFCs for gas paths to meet complex gas environment construction requirements. The instrument comes standard with an advanced turbo molecular pump set, capable of achieving an ultimate vacuum of 1.0E-5Pa. Additionally, other types of molecular pumps are available for selection. The gas path of the molecular pump is controlled by multiple solenoid valves, enabling the opening of the chamber and retrieval of samples without turning off the pump, significantly enhancing your work efficiency. Optionally, an all-in-one industrial control computer can be equipped to control the system, allowing for the majority of functions, such as the control of vacuum pump sets and sputtering power supplies, to be executed through computer programs, further boosting your experimental efficiency.Application Range:The dual-target magnetron sputtering coating machine is suitable for preparing single-layer or multi-layer ferroelectric films, conductive films, alloy films, etc. Compared to similar equipment, it boasts a wide range of applications while being compact and easy to operate, making it an ideal device for preparing material films in laboratories.Technical Specifications:Technical specifications of the dual-target magnetron sputtering coating machine:Product nameSplit type High Vacuum Dual-Target Magnetron Sputtering Coating MachineProduct modelRJ-MSV325-II-DCDC-SSPower supply voltageAC220V,50HzComplete power6KWSystem vacuum<=5×10-4PaSample stageDimensionsφ150mmHeating temperature<=600oCTemperature control accuracy±1oCAdjustable speed<=20rpmMagnetic target gunTarget sizeDiameter Φ50.8mm, thickness ≤3mmCooling modeCirculating water coolingWater flow sizeNot less than 10L/MinQuantity2Vacuum chamberCavity sizeDiameter φ325mm, height 500mmCavity materialSUU304 stainless steelObservation windowDiameter φ100mmOpening methodTop openingGas control1 mass flow meter is used to control the Ar flow, with a range of 200SCCMVacuum systemEquipped with 1 molecular pump system, gas pumping speed 600L/SFilm thickness measurementOptional quartz crystal film thickness meter, resolution 0.10 ?Sputtering power supplyEquipped with DC power supply, power 500W*2Control systemself-developed professional control systemEquipment dimensions540mm×540mm×1000mmEquipment weight145kg
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