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China, Chinese Single Target DC Magnetron Sputtering Coater for Oxide Film1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Thermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Introducing our Single Target DC Magnetron Sputtering Coater, the ultimate solution for all your film preparation needs.This professional-grade equipment is designed to deliver exceptional performance and precision, making it the ideal choice for a wide range of applications.With our Single Target DC Magnetron Sputtering Coater, you can effortlessly prepare single or multi-layer ferroelectric films, conductive films, alloy films,semiconductor films, ceramic films, dielectric films, optical films, oxide films, and even hard films. This versatility ensures that you can achieve the desired results for various materials and coatings.Equipped with advanced technology, our coater guarantees outstanding efficiency and reliability.The magnetron sputtering process ensures uniform and controlled deposition,resulting in high-quality films with excellent adhesion and uniform thickness. This ensures consistent and reproducible results, meeting the highest industry standards.Our Single Target DC Magnetron Sputtering Coater is designed with the utmost precision and attention to detail.The user-friendly interface allows for easy operation and control, while the robust construction ensures long-lasting performance. Additionally,the equipment is equipped with safety features to ensure a secure working environment.Invest in our Single Target DC Magnetron Sputtering Coater and elevate your film preparation capabilities to new heights.Experience the power of advanced technology combined with professional-grade performance. Trust in our equipment to deliver exceptional results, every timeSpecification parameters: Single target DC magnetron sputtering coaterSampleTableOverall dimensionsΦ 360 mmAdjustable RPM1-20rpm adjustableMagneto-c ontrolledtargetgunTarget planeCircular plane targetSputtering vacuum0.1Pa to 3PaTarget diameter100 to 101.6mmTarget thickness3mmInsulation voltage>2000VCable specificationsSL-16 Target head temperature<= 65 oCVacuumchamberInner wall treatmentElectrolytic polishingCavity sizeΦ500mm x 500mmCavity material304 stainless steelViewing windowQuartz window, φ100mm diameterOpening methodSide openingGascontrolFlow controlMass flowmeter, measuring range 0 ~ 100SCCMGas typeArgon, nitrogen, oxygen and other gases areavailableRegulator Valve TypesSolenoid RegulatorStatic state of regulator valveNormal closeMeasuring linearityPlus or minus 1.5% F.SMeasurementrepetition accuracyPlus or minus 0.2% F.SMeasure response time≤8 seconds (T95)Range of workingpressure difference0.3 MPaPressure resistant body3MPaWorking ambient temperature(5 ~ 45) oCBody materialStainless steel 316LLeakage rate of body1×10-8Pa.m3/sPipe fittings1/4 "jacketed jointsInput/output signals0 to 5VPower supply±15V (±5%) (+15V 50mA, -15V 200mA)Overall dimensions mm130 (W) x 102 (H) x 28 (H)Communication interfaceRS485 MODBUS protocolDC powersupplyPower supply1500W FilmthicknessmeasurementPower requirementsDC:5V (±10%) Maximum current 400mAResolution±0.03Hz(5-6MHz), 0.0136A/measurement (aluminum)Measurement accuracy±0.5% thickness +1 countMeasurement cycle100mS ~ 1S/ time (can be set)Measuring range500,000 A (aluminum)Crystal frequency6MHzCommunication interfaceRS-232/485 serial interfaceDisplay bits8-bit LED displayMolecularpumpMolecular pumping speed1200L/SRated speed24000rpmVibration value<= 0.1 umStart-up time5minDowntime7minCooling methodWater cooling + air coolingCooling water temperature<=37oCCooling water flow rate1L/minMounting directionVertical ±5.Air extraction interface150CFExhaust portKF40FrontpumpPumping rateVRD-16Ultimate vacuum1PaPower supplyAC:220V/50HzMotor power400WNoise<=56dbAir extraction interfaceKF40Exhaust portKF25ValveGate valveA gate valve is arranged between the vacuumchamber and the molecular pumpCut-off valveA cut-off valve is installed between themolecular pump and the front stageSide drain valveA side drain valve is installed between thevacuum chamber and the front stageBleeder valveAn electromagnetic bleeder valve is installedon the vacuum chamberUltimate vacuum of the wholemachine<=5X10-4PaTest target1 piece of nickel target 4 inches in diameterand 3mm thick
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