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China, Chinese 20MHz 5L Plasma Cleaner/Cleaning Machine for Sensitive Product1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Laboratory InstrumentsLaboratory Heating EquipmentPlasma CleanerPlasma Cleaning Machine
Luoyang Kunsheng Instrument Equipment Co.,Ltd
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Product Description KS-PL-5SM Quartz Plasma Cleaner - Advanced Solution for Ultra-Clean Applications in Sensitive Material ProcessingThe KS-PL-5SM is a high-purity, inductively coupled plasma (ICP) cleaning system designed specifically for the cleaning and surface activation of highly sensitive materials. With a 5-liter cylindrical quartz chamber, this unit delivers uniform plasma glow and excellent chemical reactivity, making it ideal for applications in semiconductors, medical devices, and precision optics.Operating at a high-frequency 20.0 MHz RF source, the KS-PL-5SM produces a stable, low-temperature plasma field without the need for internal electrode plates. This feature ensures maximum material compatibility, especially for conductive, fragile, or contamination-sensitive components. Its electrode-free quartz chamber also prevents metal ion contamination, enabling pristine surface treatment and cleaning down to the nanoscale.The system is controlled via an intelligent PLC interface with an integrated HMI touchscreen. Users can fully customize process parameters including RF power (0-200W), cleaning duration (0-99999s), and vacuum level (1-30 Pa), ensuring reproducible results for both manual and automated operation. Dual-channel high-precision float flowmeters allow accurate gas control for a wide range of process gases such as argon, oxygen,and CF4The KS-PL-5SM features a compact design (650×550×480 mm), yet offers industry-grade performance. The vacuum system includes a 2XZ-4 rotary vane pump, delivering fast pump-down times and stable vacuum environments. With a chamber temperature maintained below 30°C, the unit is suitable for thermally sensitive substrates.Designed for laboratory and R&D use, the KS-PL-5SM is an excellent choice for surface modification, microfabrication residue removal, photoresist stripping, or preparing substrates for high-adhesion bonding. Its clean process, ease of control, and high repeatability make it a favorite among cleanroom engineers, university researchers, and medical device developers alike.Whether you're processing high-end wafers, MEMS devices, or polymer films, the KS-PL-5SM offers a chemically precise and contamination-free cleaning platform to support your most demanding applications.Technical Parameters:Model KS-PL-5SMCavity material quality Quartz glassCavity size Φ150×270L mmCavity capacity 5LElectrode plates None (no electrode plate in the cavity)Form factor 650×550×480 mm (L×W×H)Power frequency 20.0 MHzPower supply 0-200W (continuously adjustable)Flowmeter High precision 2-way float flowmeterVacuometer Pressure gauge (quantitative value display)Control mode Fully automatic control and manual (PLC HMI)Cleaning time 0-99999S adjustableVacuum level 1-30 PaChamber temperature <30oCSupply voltage 220VVacuum pump 2XZ-4 (speed 4L/S)
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