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China, Chinese Laboratory CVD Pecvd Vacuum Multi Zone and Single Zone Coating Equipment¹ Industrial Products Supplier Manufacturer Details, price list catalog:

China Industrial Products Supplier Manufacturer List Catalog

Laboratory Instruments Laboratory Heating Equipment Coating Coating Machine

HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD

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Product Description Equipment IntroductionThe RJ150-XK is a tubular diffusion/oxidation furnace meticulously engineered for R&D applications within enterprises, universities, and research institutes. This versatile equipment supports a myriad of processes including:Polysilicon and silicon nitride depositionDiffusionOxidationAnnealingKey Features:Versatile processing for groundbreaking material researchPrecision temperature control ensures consistent and reliable resultsCompact design perfectly optimized for lab environmentsProduct Features:1. Accommodates an array of processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and beyond.2. Incorporates a highly reliable industrial computer paired with a PLC system, achieving fully automated mastery over furnace temperature, boat movement, gas flow, and valve operations, ensuring seamless automation throughout the entire process.3. Boasts a user-friendly human-machine interface that facilitates effortless modification of control parameters and real-time visualization of diverse process statuses.4. Provides multiple process pipelines for effortless user customization and selection.5. Comes equipped with robust software capabilities, including advanced self-diagnostic tools that significantly slash maintenance time.6. Offers automatic adjustment of the constant temperature zone coupled with cascade control, ensuring precise regulation of the actual process temperature within the reaction tube.7. Integrates alarms and protective mechanisms for scenarios such as over-temperature, thermocouple breakage, short circuits, and deviations in process gas flow.8. Customizable product offerings tailored to meet specific customer requirements.Technical SpecificationsModelKJ150-XKOperating Temperature≤1300oCWafer Size2~8 inches (round wafers)Number of Process Tubes1~2 tubes per unitConstant Temperature Zone Length300~600mmConstant Temperature Zone Accuracy≤±0.5oCTemperature Stability≤±0.5oC/24hTemperature Ramp RateMax heating rate: 10oC/min, Max cooling rate: 5oC/minSafety Alarms & ProtectionsOver-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functionsThe **RJ-1200T-V50** is a state-of-the-art **vertical fluidized bed CVD system** crafted specifically for conducting **powder surface deposition experiments**. The innovative furnace features an **openable design** enabling easy access post-experiment to remove the quartz tube and retrieve processed particles.Inside the furnace tube, a **0.2mm porous quartz plate** (with customizable pore size) is installed. Powder is placed on this plate, and gas is introduced from the **tube's base**. As the gas percolates through the porous plate, it **fluidizes the sample particles**, suspending them within the heating zone for optimal deposition.**Note:** During particle fluidization, excessive gas flow might cause particles to **escape the heating zone**. Hence, adjust the gas flow rate in accordance with the **particle size** during experimental procedures.Technical SpecificationsParameterSpecificationHeating Zone Length400mmFurnace Tube DimensionsDiameter: 50mm, Length: 900mmFurnace Tube MaterialHigh-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)Operating Temperature≤1100°CMaximum Temperature1200°CTemperature SensorType N thermocoupleTemperature ControlIntelligent 30-segment PID programmable microcomputer control with auto-tuningTemperature Accuracy±1°CTemperature ProtectionOver-temperature and thermocouple breakage protectionHeating Rate0-20°C/minHeating ElementAlloy resistance wireOperating VoltageAC220V, single-phase, 50HzMaximum Power3KWFurnace Chamber MaterialPolycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distributionFlangeStainless steel vacuum flange, easy to disassembleSealing SystemO-ring compression seal between furnace tube and flange, reusable, high airtightnessFluidization Zone1. Reaction gas uniformly passes through the reaction zone.2. Solid particles are fluidized by gas in the heating zone.3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.NoteExcessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.Shell StructureDouble-layer shell with air-cooling system, openable designFurnace StructureVertical structureParameterSpecificationInternal Temperature≤45oCMeasurement & Control Devices NameDual-channel Mass Flow Controller (MFC)Gas Channels2 channelsFlow ControlDigital display, each gas line with independent needle valve controlConnection MethodDouble ferrule fittingFlow MeterMass flow meterFlow RangeMFC1: N 0-10 SLMMFC2: CO 0-10 SLMGas MixingEquipped with a precision gas mixing chamberPower Supply220V, 50HzOperating Ambient Temp.5oC~45oCStandard AccessoriesMain unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,high-temperature gloves ×1 pair, crucible hook ×1,hex wrench for flange disassembly ×1, warranty card & manual ×1 setEquipment IntroductionThe vertical dual-zone CVD system features the following components:A 1200°C dual-zone tube furnaceA 3-channel mass flow controller (MFC) gas supply systemA 2L/s vacuum pump complete with essential connecting componentsThe system is equipped with directional and swivel casters securely mounted at the base, offering a compact footprint and remarkable mobility.Discover a state-of-the-art solution designed for cutting-edge CVD processes, making this system the ultimate choice for renowned universities, pioneering research centers, and forward-thinking industrial manufacturers to seamlessly conduct experiments and facilitate production processes involving high-precision chemical vapor deposition.(Note: Crafted for precision, ensuring technical accuracy while flowing naturally in English.)Fluidized Bed Tube Furnace SpecificationsParameterSpecificationMaximum Temperature1200°COperating Temperature≤1100°CDisplayLCD touch screenTube Diameter40mm (OD)Tube MaterialCustom high-purity quartz tubeFurnace Tube LengthApprox. 1100mm (customizable)Heating ElementPremium heating wireHeating Rate0-10°C/minTemperature Control- Programmable 30-segment time-temperature curves- Touchscreen multi-segment PID control- Data logging with Excel export capability- Built-in over-temperature and thermocouple failure protectionThermocoupleType N thermocoupleSealing MethodCustom stainless steel vacuum flange with sealingFurnace Chamber- Double-layer steel shell with dual cooling fans- Dual-zone vertical open structure for easy tube access- Alumina refractory fiber lining for energy efficiencyVacuum FlangeStainless steel vacuum flange with valveOperating Voltage220V, 50HzPower Rating6KW (customizable)Gas Delivery System: Experience precision with our 3-Channel Mass Flow Control SystemParameterSpecificationPower Supply220V/50Hz, maximum output 18WKey Features:Enhanced with an advanced touchscreen control system that incorporates comprehensive data recording capabilitiesIngeniously designed dual-zone vertical architecture optimizing thermal management for peak performanceIncorporates a complete and efficient gas flow control systemMeticulously crafted with a safety-focused design, featuring multiple protective measuresAdaptable components, easily customizable to meet specific research demandsNote: Customization of specifications is possible to meet actual requirements. This system harmonizes precision temperature control with an efficient gas delivery mechanism for superior CVD applications.ParameterSpecificationMaximum Pressure3×10 PaGas ChannelsCan simultaneously connect 3 gas sources to slightly positive pressureFlow MeterMass flow meter (other ranges optional)Channel A Range1 SLMChannel B Range1 SLMChannel C Range1 SLMGas Line Pressure-0.1 ~ 0.15 MPaAccuracy±1% F.S.Shut-off ValveStainless steelGas Line Tubing1/4" stainless steel tubeVacuum System ComponentsComponentSpecificationVacuum Pump2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tubeVacuum GaugeIncluded (standard configuration)Primary Application:This innovative dual-zone sliding-track CVD tube furnace boasts a high-efficiency rail-guided sliding design, facilitating rapid thermal transitions by horizontally moving the furnace. It seamlessly integrates with up to six distinct gas sources, ensuring precision in flow measurement and control with a user-friendly touchscreen 6-channel mass flow controller (MFC).This cutting-edge high-temperature CVD system is expertly designed to meet the needs of esteemed universities, leading research institutions, and innovative industrial manufacturers to execute experiments and production related to advanced chemical vapor deposition (CVD) techniques.Key Features:Revolutionary sliding-track mechanism enabling rapid and efficient thermal cyclingComprehensive multi-gas compatibility (featuring 6 independent channels)Precision-engineered flow control with an intuitive touchscreen MFC interfaceEnabling versatile applications for both research and small-batch production endeavorsParameterSpecificationFurnace Access ModeSwing-open designFurnace MovementRail-guided horizontal sliding for rapid heating/coolingChamber MaterialAlumina refractory fiberHeating ElementAluminum-containing heating wireMaximum Temperature1200°COperating Temperature≤1100°CHeating Rate≤20°C/min (Recommended: 15°C/min)Heating ZonesDual-zoneTotal Zone Length200mm + 200mmTube MaterialHigh-purity quartzTube Diameter60mmSealing Method- Quick-release flange for material loading- Stainless steel vacuum flange with silicone sealControl SystemMulti-segment intelligent PID programmingTemperature SensorType N thermocoupleSafety AlarmsOver-temperature & thermocouple failure alarmsPower Supply220V, 50HzGas Delivery System (KJ-6Z)ParameterSpecificationOperating Temperature5~45°CMaximum Pressure3×10 PaGas Channels6 independent gas inputsFlow Meter TypeMass flow meter (other ranges available at same cost)Channel A Range0-300 SCCMChannel B Range0-300 SCCMChannel C Range0-300 SCCMChannel D Range0-300 SCCMChannel E Range0-300 SCCMChannel F Range0-300 SCCMLine Pressure-0.1~0.15 MPaValvesStainless steel shut-off valvesTubingStainless steelVacuum SystemComponentSpecificationPump SystemMolecular pump unit with connecting pipesPower220V/50HzMobilityWheel-mounted base for easy movementUltimate Vacuum6.67×103 PaStandard AccessoriesDurable Quartz furnace tube (1)Comprehensive vacuum flange set (1)Key Features:A unique sliding mechanism designed for expedited thermal cyclingSix-channel precision gas control system for meticulous flow managementResearch-grade vacuum capability ensuring optimal performanceComplete turnkey solution equipped with all essential accessoriesRobust industrial-grade construction incorporating vital safety protections Precision-crafted tube stoppers (2)High-quality O-ring sealsSafety-approved protective gloves (1 pair)Convenient crucible hook (1)Reliable PTFE tubing (3m)Essential hex keys (2)Comprehensive operation manualThis system is meticulously designed for Revolutionize your research with our state-of-the-art CVD processes.Our system supports a wide array of applications, including:Advanced silicon carbide coating for unparalleled durability and performance.Precision conductivity testing tailored for ceramic substrates.Innovative 2D material growth for next-generation technologies.Meticulously controlled growth of ZnO nanostructures for superior quality.Atmosphere sintering of ceramic capacitors (MLCC) to enhance efficiency.It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sophisticated sliding rail base design, allowing effortless manual lateral movement to expose the tube to room temperature for ultra-fast cooling.This equipment is specifically engineered for CVD experiments that necessitate rapid heating/cooling rates,making it exceptionally suited for:High-efficiency graphene synthesis and production.Other CVD applications that require swift thermal cycling.Key Advantages:Precision temperature control ensures optimal conditions for sensitive material growth.Unique sliding mechanism enables quicker, more efficient processing.Versatile applications extend across advanced material research fields.Optimized for both graphene and other general CVD processes.Sliding Rail Tube Furnace SpecificationsFurnace SectionParameterSpecificationFurnace StructureSliding rail designMaximum Temperature1200°CContinuous Operating Temperature≤1100°CHeating RateUp to 20°C/min (Recommended: 10°C/min)Heating Zone Length300mm (Single zone)Heating ElementPhase-resistant heating wireThermocoupleType KTemperature Accuracy±1°CTube Diameter OptionsΦ50, Φ60, Φ80Tube MaterialHigh-purity quartzTemperature ControllerPID intelligent program controlVacuum Flange304 stainless steel- Left flange: Equipped with needle valve + ball valve- Right flange: KF25 interface with baffle valvePower Supply| Input Power | Single-phase 220V, 50Hz, 3KW |Vacuum SystemComponentSpecificationRotary Vane Pump with Digital Gauge- Ultimate vacuum: 103 Torr- Tube vacuum: 102 Torr- Pumping speed: 4CFM (2L/s, 120L/min)- Options: Rotary vane pump/diffusion pump/molecular pump availableMass Flow Controller SystemParameterSpecificationChannels3-channel high precision MFCFlow RangeMF1-MF3: 50-1000sccm adjustableFeatures- Mixing chamber at bottom- 3 manual stainless steel needle valvesImportant NotesWarningDescriptionPressure LimitTube pressure must not exceed 0.02MPaGas Cylinder SafetyMust use pressure reducer (0.01-0.1MPa recommended)High Temp OperationAbove 1000°C: Maintain atmospheric pressureGas Flow Limit<200SCCM to protect quartz tubeQuartz Tube LimitContinuous use <1100°CValve WarningNever close both valves during heatingCertifications| ISO Certification | CE Certification |Safety Precautions:Never open the furnace chamber when temperature ≥200°C to safeguard against personal injury.Ensure tube pressure does not exceed 0.02MPa (absolute pressure) during operation to prevent equipment damage from overpressure.Warning: Ignoring these precautions may lead to:Severe personal injurySignificant equipment damagePotential safety hazards When furnace temperature >1000°C, avoid vacuum in the tube - maintain atmospheric pressure inside the tube.Do not close both inlet and outlet valves simultaneously during sample heating. If valve closure is necessary:Monitor pressure gauge readings continuouslyImmediately open exhaust valve if absolute pressure exceeds 0.02MPaPrevent hazardous scenarios (tube rupture, flange ejection, etc.)Equipment Application & FeaturesThis high-temperature CVD tube furnace is meticulously crafted for chemical vapor deposition (CVD) processes, including:Cutting-edge silicon carbide (SiC) coating for robust applications.Tailored conductivity testing of ceramic substrates for precision measurement.Precisely controlled growth of ZnO nanostructures for superior outcomes.Expert atmosphere sintering of ceramic capacitors (MLCC) to enhance performance.Primary Users:Our RJ Trademark CVD PECVD System is the preferred choice for universities, research institutions, and industrial manufacturers focused on vapor deposition-related experiments and production. It's designed to serve as a cornerstone in pioneering research and groundbreaking industrial applications.Key Specifications: Discover the exceptional features of our RJ Trademark CVD PECVD System.The robust Alumina (AlO) furnace tube is engineered to withstand extreme temperatures, reaching up to an impressive 1600°C, ensuring durability and reliability in demanding conditions.With an innovative design that supports both vacuum and atmospheric operations, adaptability and versatility are at the core of our system's functionality.Featuring high-performance MoSi (molybdenum disilicide) heating elements, our system guarantees unparalleled and consistent heating efficiency.Our furnace chamber is crafted with sophisticated ceramic fiber insulation, providing outstanding thermal uniformity and maximizing energy efficiency for optimal performance.Advantages: Elevate your research and production capabilities with our system's unmatched benefits.Experience remarkable high-temperature stability, offering precision within ±1°C, to ensure reliable and consistent experiment and production outcomes.Benefit from rapid heating and cooling cycles combined with superior heat retention, optimizing both speed and energy efficiency.Our system is designed for safe and user-friendly operation, prioritizing the well-being of the user while enhancing productivity and ease of use.Versatile enough for advanced materials research, our system supports innovation and exploration in cutting-edge scientific fields.ParameterSpecificationMaximum Temperature1700°COperating Temperature1600°CDisplayLED ScreenTube Diameter80mm (OD)Tube MaterialAlumina TubeHeating Zone Length220+220+220mm (with gaps between zones)Heating ElementMoSi (Molybdenum Disilicide)Heating Rate0-5°C/minTemperature Control- PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor- 30 programmable segments for ramp/soak control- Built-in PID auto-tuning with over-temperature & thermocouple failure protection- Over-temperature alarm allows unattended operationThermocouples3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)Temperature Accuracy±1°CFurnace Structure- Double-layer steel shell with dual cooling fans (surface temp <60°C)- Fixed non-openable furnace designVacuum FlangeStainless steel vacuum flange with valveOperating Voltage220V 50HzMaximum Power6kWGas Delivery System: A sophisticated mechanism to support seamless gas management and distribution.ComponentSpecification4-Channel Mass Flow Controllers- MFC1: 0-100sccm- MFC2: 0-200sccm- MFC3: 0-500sccm- MFC4: 0-200sccmGas Mixing- Bottom-mounted mixing chamber with liquid release valve- 4 manual stainless steel needle valves for gas controlVacuum System: Engineered for premium industrial-grade vacuum performance, ensuring optimal operations.ComponentSpecificationVacuum Pump + GaugeRotary vane pump achieves 10Pa vacuum (cooled state)Key Features: Delve into the cutting-edge capabilities that make our system stand above the rest.Set new benchmarks with ultra-high temperature capability reaching 1700°C, driven by our MoSi heating elements designed for extreme conditions.Utilize precision multi-zone temperature control to maintain accuracy within ±1°C, ensuring meticulous and consistent temperature management.Leverage programmable 30-segment thermal profiles for advanced customization, enabling tailored heating strategies for distinct applications.Our complete gas mixing system, featuring 4-channel MFCs, provides exceptional control and flexibility for various experimental setups.Industry-leading vacuum performance is delivered by our robust vacuum system, supporting high-level operational requirements.Safety Precautions: Prioritize safety with our comprehensive guidelines designed to prevent accidents and ensure a secure operational environment.Avoid opening the furnace chamber when the temperature is equal to or greater than 200°C to safeguard against potential injuries. This essential precaution helps prevent personal injury and ensures safe handling.To avert equipment damage due to overpressure, ensure that tube pressure does not exceed 0.02MPa (absolute pressure) during operation. Maintain operational integrity and avoid equipment damage by adhering to recommended pressure limits.Warning: Non-compliance with these precautions could lead to significant risks and damages. Ignoring these precautions may result in serious personal injury, equipment damage, and potential safety hazards.Be aware of the potential for serious personal injury if safety measures are not followed.Mitigate risks of equipment damage by adhering to operational guidelines.Ensure a safe working environment by preventing potential safety hazards through compliance. When the furnace temperature exceeds 1000°C, maintain atmospheric pressure within the tube to avoid creating a vacuum. Preserve equipment integrity by maintaining atmospheric pressure inside the tube.Avoid the simultaneous closure of both inlet and outlet valves during the heating of samples. If closure of valves is necessary, ensure continuous monitoring of pressure gauge readings.Continuously monitor pressure gauge readings to maintain safe operational parameters.Immediately open the exhaust valve if absolute pressure exceeds 0.02MPa to prevent hazardous situations.This proactive measure prevents hazardous situations such as tube rupture or flange ejection.Equipment Description: Explore the comprehensive integration of advanced components within our system.This cutting-edge system integrates a gas flow control system, liquid injection system, and multi-stage temperature-controlled growth zones.Our advanced gas flow control system ensures precise and efficient gas management.The liquid injection system provides enhanced capabilities for material processing.Multi-stage temperature-controlled growth zones offer optimal thermal management for various applications.A robust water cooling system is included to ensure consistent operation and temperature regulation.CNT Growth Furnace Specifications: Detailed technical specifications for precise carbon nanotube growth.Maximum operating temperature: Efficiently adjustable from 0 to 1400°C, supporting a wide range of research conditions. The system allows continuous adjustment of temperature from 0-1400°C, accommodating diverse experimental needs.Our vertical thermal field distribution ensures even heat allocation for optimal process outcomes. Achieve superior results with our vertical thermal field distribution, enhanced by dual-zone temperature control for precise thermal management.The top-mounted liquid injection port, equipped with flow guide components, facilitates seamless material introduction. Our system includes a top-mounted liquid injection port,This state-of-the-art CNT/thin-film CVD equipment empowers researchers and manufacturers to achieve groundbreaking results. Our cutting-edge CNT/thin-film CVD equipment enables continuous, uninterrupted growth processes with precision. With our equipment, you can achieve continuous, uninterrupted growth processes, streamlining production.Our system supports continuous, uninterrupted growth processes, ensuring efficiency and consistency.It facilitates precise thermal management, crucial for controlled nanostructure synthesis. Achieve controlled nanostructure synthesis with our precise thermal management capabilities.Integrated liquid/gas phase delivery enables complex material deposition for advanced research. Our system supports complex material deposition with integrated liquid/gas phase delivery.Specialized components are dedicated to carbon nanotube (CNT) synthesis, facilitating state-of-the-art research and development.Technical Specifications - Carbon Nanotube/Nanowire CVD Growth FurnaceParameterSpecificationEquipment NameCarbon Nanotube/Nanowire CVD Growth FurnaceModelKJ-T1400VFurnace StructureDouble-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanlinessMaximum Power20KWVoltageAC 220V single-phase, 50/60HzHeating ElementSilicon carbide (SiC) rodsMax Operating Temp1400°CContinuous Working TempAdjustable between 100-1400°CHeating Rate1-10°C/minFurnace Tube Material & DimensionsAlumina tube: OD 80mm × Length 1500mmHeating Zone Length700mm + 400mmUniform Temp Zone Length800mm (±1°C)ThermocoupleSEI thermocouple for temperature measurement and controlTemperature Control System30-segment PID programmable controlTemperature Accuracy±1°CStainless Steel FlangeThe system includes a stainless steel vacuum flange assembly (equipped with stainless steel needle valves and mechanical pressure gauge). The armored flange allows thermocouple extension to the inlet for temperature monitoring.Key Features:High-purity alumina tube for contamination-free growthPrecision temperature control (±1°C) across 800mm uniform zoneNote: All specifications subject to technical verification. Designed for advanced nanomaterial synthesis under controlled atmospheres.Robust SiC heating elements for ultra-high temperature operationComplete gas/vacuum interface with measurement capabilitiesEquipment IntroductionThe LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:Double-layer shell structure with an air-cooling system, keeping the surface temperature below 55°C30-segment PID programmable intelligent temperature control with phase-angle firing for precise heatingAlumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distributionApplications:Silicon carbide (SiC) coatingConductivity testing of ceramic substratesControlled growth of ZnO nanostructuresAtmosphere sintering of ceramic capacitors (MLCC)Key Advantages:User-friendly touchscreen interfaceEnergy-efficient thermal designResearch-grade temperature uniformityVersatile for advanced material processing Fully automated operation with unattended capabilityHigh-Temperature Furnace SpecificationsParameterSpecificationFurnace StructureDouble-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanlinessMaximum Power5KWVoltageAC 220V single-phase, 50HzHeating ElementAl-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)Max Operating Temp1200°CContinuous Working Temp1100°CHeating Rate1-10°C/minFurnace Tube Material & DimensionsQuartz tube: OD 80mm × Length 1000mmHeating Zone LengthTotal 440mmUniform Temp Zone Length150mm (±1°C)Control InterfaceLCD touch screenThermocoupleType N thermocouple, 3 calibrated thermocouples with real-time display on furnace screenTemperature Control30-segment PID programmable controlTemperature Accuracy±1°CVacuum Sealing SystemTwo stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)High Vacuum System- Control panel for molecular pump speed/vacuum level monitoring- Turbo molecular pump + dry scroll pump- All KF-25 standard connections between pumps and quartz tubeVacuum Level6.7×103 Pa (empty chamber, room temperature)Gas Delivery SystemThree mass flow controllers with ranges:? Channel 1: 1-100 sccm? Channel 2: 1-200 sccm? Channel 3: 1-500 sccmKey Features:Ultra-clean alumina-coated chamber for contamination-sensitive processesPrecision 3-zone temperature monitoring (±1°C)Research-grade vacuum capability down to 103 PaComplete gas flow control with triple MFC channelsIndustrial-grade components with extended durability

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