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China, Chinese Benchtop Multi-Layer Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Metallic Processing MachineryMetal Coating MachineryAlloys & Dielectric FilmMetals Film DepositionFilm Evaporator
Xiamen Tmax Battery Equipments Limited
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Product Description Benchtop Multi-Layer Thermal Evaporator Deposition Coating For Metals, Alloys & Dielectric Film TMAX-ZY-ZD01-Multi-Layer Deposition for Metals, Alloys & Dielectric Thin FilmsProduct OverviewThe TMAX-ZY-ZD01 is a desktop thermal evaporation system designed for high-precision thin-film deposition in research and small-scale production. Featuring a turbomolecular pump vacuum system and multi-source evaporation capabilities, it enables efficient deposition of metals, alloys, and dielectric films with minimal operator training. Key Features & Advantages1. Wide Application Range· Materials Research: Metal films, dielectric layers, polymer coatings.· Functional Devices: Thin-film sensors, optical coatings, nanoelectronics.· Multi-Layer Deposition: Supports up to 99 layers in a single run.2. User-Friendly Operation· Plug-and-play design-no specialized lab environment required.· 10-inch touchscreen for intuitive control and process monitoring.· Preloaded 100+ deposition recipes for quick setup.3. High Precision & Stability· Quartz crystal monitoring ensures real-time thickness control (≤3% uniformity).· Turbo-molecular pump (300L/s) achieves ≤6×10-5 Pa ultimate vacuum.· 3 independent evaporation sources prevent material cross-contamination.4. Flexible Configuration· Optional: Co-evaporation for alloys, 400°C substrate heating, and cooled rotating stage.· Automatic & manual modes for customized process control.5. Low Maintenance & Compact Design· Aluminum chamber for efficient heat dissipation.· 65 kg weight, suitable for benchtop use in labs or offices. Technical SpecificationsParameterSpecificationChamber?300 × 350(h) mm (quartz glass)Vacuum System300L/s turbomolecular pump + dual-stage rotary pumpUltimate Vacuum≤6 × 10-5 Pa (after baking)Leak Rate≤5.0 × 10-9 Pa·L/sDeposition Rate≥10 nm/min (material-dependent)Film Uniformity≤3% (with rotation)Evaporation Sources3 independent thermal sourcesMax Layers per Run99 layers (up to 4 materials)Control Interface10" touchscreen with programmable recipesPower SupplyAC 230V, 32A, 50HzCooling Water (Optional)0.2 MPa, 15-25°C, ≥8 L/min Operational Workflow1. Automated Deposition: Pre-programmed vacuum pumping, heating, and evaporation.2. Multi-Layer Control: Supports time-based or thickness-based deposition modes.3. Remote Monitoring: Adjust parameters via network connection. Why Choose? Combines research-grade performance with desktop convenience. Minimal training required-ideal for multi-user environments. Scalable for both experimental and small production needs. Certifications
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