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China, Chinese Alumina Ceramic Wafer Polishing Plate for Semiconductor Manufacturring Equipment1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Industrial Customized ServiceOther Custom Fabrication ServiceChemical Mechanical Polishing (CMP)Alumina Ceramic Wafer Polishing Plate
Pingxiang Chemshun Ceramics Co., Ltd.
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Product Description Alumina Ceramic Wafer Polishing Plate for Semiconductor Manufacturring Equipment Application:Pingxiang Chemshun Ceramics' High Purity 99.7% Alumina Ceramic Sapphire Polishing Turn Table As an important component of CMP chemical mechanical polishing process. CMP is the necessary for producing process of the sapphire and Wafer.Features : High rigidity (Hardness, Mechanical Strength, Wear Resistance)High chemical durabilitySurface shape & roughness controlPretty PriceSize:Disc, ring size below ?850mm, thickness 45mm.For example: D150mm, D360mm, D450MM D600mm. Customized products with various size are accepted.Main Parameter : (Chemical / physical): PropertyUnitChemshun ProductDensityg/cm33.94-3.97Al2O3%99.7-99.9Vickers hardnessGPa>=17Three-point bending strengthMPa440-550Thermal Diffusion CoefficientCm2/S0.0968Modulus of ElasticityGpa356 Chemshun Ceramics High Purity 99.7% Alumina Ceramic Sapphire Polishing Turn Table widely used in the semiconductors manufacturing equipment. For more information, welcome to direclty contact with us.
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