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China, Chinese Three Target Magnetron Sputtering Coating Instrument with Cleaning Function for Lab1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Spraying Machinery Spreading EquipmentThermal Spray EquipmentPVD Coating MachineCoating Machine
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Product introduction: this equipment is three target magnetron sputtering coater apparatus, which can be used for the preparation of metal thin films. It has applications in the fields of electronics, optics, and special ceramic preparation. It can also be used for laboratory SEM sample preparation.The three target magnetron sputtering coater is equipped with two magnetron targets and two sets of DC power supplies, which can be used to coat multilayer conductive metal films. At the same time, the equipment has two parts: a main chamber and a transition chamber. The transition chamber is equipped with a magnetic push rod, and a vacuum gate valve is installed between the two chambers; The user can load samples in the transition chamber while performing sputtering work in the main chamber, and perform vacuum pre-pumping. After the sputtering in the main chamber is completed, the sample can be pushed into the sample stage of the main chamber through the magnetic push rod. Such a design can reduce the number of vacuum pumping times in the main chamber, which not only effectively saves time, but also ensures a better local vacuum and effectively improves the quality of the coating.Three target magnetron sputtering coater technical tarameters:Working Voltagel VAC 220, 60HzSputtering Vacuum Chamberl Dimension: ~ φ325xH510mml Material: 304 stainless steell Inner wall processing: electrolytic polishingl Sealing method: Fluorine rubber seall Viewport (window): ~4'' (100mm) with shutterSample Holderl Center bottom setting sample holder, with one shutterl Sample holder: Dia. 150mml Rotary speed: 0~20rpm adjustablel Heating temperature: RT~ 500oCMagnetron Sputtering Gunl Quantity: 3 setsl Adjustable angle -45°~45°l Sputtering orientation downwardsl Target dimension: diameter 2'', thickness max.3mmQuartz Crystal Monitorl Channel numbers: One-channell Accuracy: 0.1?l Measurement speed: 100mS-1S adjustablel Measurement range: 500 000? (Aluminum as a reference)l Standard sensor quartz crystal: 6MHzVacuum SystemBacking Pumpl Double-stage rotary vane pumpl Pumping rate: 1.1L/sMolecular Pumpl Pumping rate: 600 L/sl Rated rotating speed: 27000rpml Starting time: <5minl Cooling method: water coolingl Vacuum degree: 5*10-4PaComposite Vacuum Gaugel Resistance gauge + ionization gaugel Measuring range: 10-5Pa ~ 105 PaDC Power Supplyl Quantity: 2 setsl Output power: 0~500Wl Output voltage: 0~600Vl Maximum output current: 1Al Starting time: 1~10sRF power supplyl Quantity: 1 setl Output power: 0~500Wl RF frequency: 13.56 MHzl Matching method: automatchl Reflected power: <=100Wl Power stability: ±0.1%Mass Flow Controllerl One-channel MFC for Ar gasl Measuring range: 0~200sccmWater Coolerl Flow rate: 10L/minl Power: 0.1KWl Cooling power: 50W/oCl Tank capacity: 9LControll PLC automatic controlTransition chamberl The chamber size will be for max. 4inch wafers.l Equipped with one compact molecular pump groupl Backing pump: VRD-4, pumping speed: 1.1L/sl Model of molecular pump: TG60Fl Pumping speed of molecular pump: 60L/s
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