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China, Chinese Vacuum Coating Machine for Metal Parts with Magnetron Sputtering Technology1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Metallic Processing MachineryMetal Coating MachinerySputtering Coating MachineSputtering Coating System
Jinan ACME Power Supply Co., Ltd.
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Product Description Product DescriptionThis coating system is a circular vacuum chamber structure, with exhaust at the rear and a front door structure, and is made of high-quality austenitic stainless steel. One (two) 2-inch (or 3-inch) magnetron sputtering targets are installed on the top plate of the sputtering deposition chamber. The direction of the outgoing beam is toward the substrate rack and a thin film is obtained on the substrate. The equipment has a simple structure and can be used to research and develop nano-scale single-layer and multi-layer functional films, such as hard films, metal films, semiconductor films, dielectric films, composite films, ferromagnetic films, magnetic films and other new thin film materials. .Main parameters of the systeml Ultimate vacuum degree: ≤6×10-5Pa (obtained within 12 hours under cleaning + baking and degassing conditions);l Vacuuming time: within 30 minutes, ≤6×10-4Pa;l Substrate heating temperature: ≤600oC;l Substrate size: ≤Φ3inch wafer;l Number of substrate racks: 1 set;l Target size: 50mm diameter (optional 3inch);l Number of targets: 1 or 2;l Vacuum chamber size: DN250*340 (may be adjusted appropriately according to actual conditions);l Substrate rack moving distance: ≤50mm (axial direction);l Angle between target axis and substrate rotation axis: co-sputtering;l Gas system: 2-way air intake, 1 of which is used for exhaust; ItemSpecifications and DescriptionVacuum ChamberSputtering vacuum chamberDN220*320, the size can be adjusted according to the design requirements, the upper cover can be opened, and the door can be openedUltra-high vacuum throttle valve DN100, electric control, optional automatic constant pressure function Molecular pump Molecular pump 110L/S or 150L/S Mechanical pump DVR16 rotary vane pump, also serves as pre-pump and fore-stage pumpBaffle valve DN25 electromagnetic baffle valve, pre-pump pipeline on-off Stop valve 6mm double ferrule interface electric stop valve Lighting and baking device Optional Various types of flanges and observation windows DN16, 35, 63, 100, 150 Stainless steel pipelines, pipe joints Various specifications of precision stainless steel pipes, bellows, pipe joints Vacuum measurement and air intakeDigital composite vacuum gauge 5227 composite vacuum gauge or imported full-range gauge optional Metal bare gauge ZJ52T, ZJ27 metal interfaceMass flow controller D07-7B mass flow controller, range 100sccm Pipes and connectors Mixed gas chamber Stop valve 6mm double ferrule interface electric stop valve Intake and other control interfaces Pressure regulating valve electric control, feedback available Sample rackRotating substrate rack Substrate rotation, substrate rack lifting Lifting device Lifting manual adjustment Sputtering substrate heating device ≤600oC Heating device optional Temperature control power supply Japan Shimaden temperature control, PID temperature control Sputtering systemMagnetic control sputtering target Integrated sputtering target, optional 2-inch or 3-inch, with baffle Sputtering power supply 500W optional DC or RF Equipment rack Integrated layout Water and gas system Including cooling water machine Control system Standard manual, optional touch screen automatic controlMain parameters of the system:l Ultimate vacuum degree: ≤5×10-5Pa (obtained within 12 hours under cleaning + baking and degassing conditions);l Vacuuming time: within 40 minutes, ≤5×10-4Pa;l Substrate heating temperature: ≤600oC (iodine tungsten lamp heating);l Substrate size: ≤Φ3inch round wafer;l Target size: 2 inches or 3 inches;l Number of targets: 3;l Vacuum chamber size: 400×400×H380~450 (may be adjusted appropriately according to actual conditions);l Substrate rack moving distance: ≤50mm (axial direction);l Angle between target axis and substrate rotation axis: co-sputtering;l Gas system: 4-way air intake, 1 of which is for exhaust;This small coating machine has a compact structure and a simple and elegant appearance. It is easy to operate and maintain and has low operating costs. The main unit and the electronic control system of this device adopt an integrated design. The main unit consists of an equipment rack, a pumping system, and a vacuum chamber. The coating process is carried out in the sputtering vacuum chamber; the electronic control part adopts a standard control cabinet, which contains various modular plug-in boxes. The system is powerful and has stable performance.The basic parameters of the ultra-high vacuum magnetron sputtering coating machine are as follows:l Ultimate vacuum of coating chamber: ≤6×10-5Pa;l Pumping time: better than 6×10-4Pa within 30 minutes;l Vacuum chamber size: 300×300×H350mm, the vacuum chamber is made of stainless steel;l Target size and quantity: 2 φ50mm permanent magnet targets;l Target-substrate distance is adjustable (40~100mm, adjusted by target position);l Substrate rotation: 0~60 rpm adjustable; equipped with heating, can be heated up to 500 degrees;l Main machine size: about 1100mm long×750mm wide×1650mm high;l Gas type: 2-way MFC, working gas Ar+reaction gas;l Film thickness measurement: equipped with a set of quartz crystal film thickness meter and original probe (optional);l Control system: Touch screen + PLC control is adopted to control the start and stop of pumps, valves, and various output alarms; Main parameters of the system:l Ultimate vacuum degree: ≤5×10-5Pa (obtained within 12 hours under cleaning + baking and degassing conditions);l Vacuuming time: within 40 minutes, ≤5×10-4Pa;l Substrate heating temperature: ≤600oC (iodine tungsten lamp heating);l Substrate size: ≤Φ3inch round wafer;l Target size: 2 inches or 3 inches;l Number of targets: 4;l Vacuum chamber size: 500×500×H450 (may be adjusted appropriately according to actual conditions);l Substrate rack moving distance: ≤50mm (axial direction);l Angle between target axis and substrate rotation axis: co-sputtering;l Gas system: 4 air intakes, 1 of which is for exhaust; The basic parameters of the ultra-high vacuum magnetron sputtering coating machine are as follows:l Ultimate vacuum of coating chamber: ≤6×10-5Pa;l Pumping time: better than 8×10-4Pa within 30 minutes;l Vacuum chamber size: 300mm×300mm×H400mm, the vacuum chamber is made of stainless steel and equipped with a glass observation window;l Target size and quantity: 2 φ50mm permanent magnet targets (integrated);l Sputtering power supply: 2 500W digital DC sputtering power supplies;l Pressure control, equipped with film gauge and electric butterfly valve to achieve constant pressure control;l Horizontal moving distance 0~80mm, equipped with isolation plate to avoid slag falling during movement;l Hot pressing system: lower substrate heating temperature: 0~600oC continuously adjustable. The upper plate is pneumatically controlled to press down;l Main unit size: length 1060mm×width 600mm×height 1600mm; (the size will be adjusted appropriately according to needs)l Gas type: 2-way mass flow controller, 2-way air intake;Company ProfileOur company can provide customers with diversified vacuum coating system design solutions, which can flexibly achieve co-sputtering deposition, multi-layer film deposition, insulating films, and compound film preparation, meeting the requirements of film preparation in various fields. The developed multifunctional evaporation coating machine is widely used in the research and development of OLED and OPV products. On the basis of standard configuration, our company can customize coating machines for specific purposes, portable coating instruments, testing instruments, and non-standard vacuum products according to customer needs. CertificationsPackaging & ShippingCustomer satisfaction,our responsibility!"Unity,rigor,initiative and innovation"is the essence of the corporate culture of ACME.It is deeply rooted in the business philosophy of"Customer Satisfaction,Our Responsibility!",constanty surpasing customer expectations and win the trust of many reputable companies.ACME provides professional,fast anddedicated services for every customer.Pre-sales,sales and after-sales servicepersonnel servellprovinces, cities and regions in the country,and establish offices in customer concentration areas.ACME power,service is at your side.In orderto create a global gold power supplier,ACME takes "Technology Priority,Reliable Quality and Customer Satsfaction"asthe ultimate goal,adhere to theservice tenet of "Customer Satisfaction",carefully shape the brand image of ACME Energy Service,and provide customers with the fastest and most efficient after-sales service.At the same time,provide comprehensive training for the customer,actively organizetechnical exchanges,achieve common growth,andachievewin-win goals.1)Quick response:Customer Service Engineering provides customers with 7X24 hours of product technical support and solution consulting. The field service response:City:Arrive within 2 hours (with service outlet city); Within the province:arrive within 24 hours;Outside the province:arrived in 48 hours;In addition,ACME has after-sales special service,providing emergency response services,able to arrive at the scene in the fastest time.2)24/7 service mechanism:365 days:everyday service,fully in place; 24-hour consultation service,all the time;24 hours of technical support,useassured;24-hour on-site service to ensure peace of mind;3)Service team:Pre-sales support team:professional pre-sales technical consultation provided by professional and technical personnel; Technical support team:thoughtful after-sales service provided by professional after-sales service engineers;Customer complaint handling clerk:acceptall kinds of complaints from customers,deal with themquickly,and provide timely feedback.4)Humanized service planRemote guidance:provide technical support such as remote telephone and mail; On-site service:Provideon-site maintenance,technical support and other services;Inspection service:Provide regular return visitsand inspection services;Stagnation service:Provide long-term stagnation services required for the project.
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