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China, Chinese Lanthanum Hexaborid Lab6 Sputtering Target, Custom Sizes Available, MOQ: 1PC1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Ceramic MaterialZirconia CeramicsCustom Sizes AvailableMOQ: 1PCLanthanum Hexaborid Sputtering TargetCustom Lab6 Target
Changsha Xinkang Advanced Materials Co., Ltd.
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Product Description Product DescriptionXinKang Factory Supplies Premier Top-Ranking 99.9% Pure LaB6 Ceramic Target - Lanthanum Hexaborid for PVD CoatingNameLanthanum Hexaborid Ceramic Sputtering Target / LaB6 ceramic targetsMaterialLanthanum Hexaborid LaB6 Ceramic MaterialsPurity99.9%-99.995%, 3N,3N5,4N,4N5,5N,5N5,6N.SizeD3x3mm, 2inch,3inch,Or As RequestColorPurple ColorShapePellets, Granules,Planar/Round/Plate/Rotary/Bar , As Request.SurfacePolished SurfaceDensity4.7g/cm3Melting Point2715°CApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etcRelated ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targetsNoteSupport customize size,shape,purity,different alloy proportion etc.Contact us firstly (Price is based on size and purity)Description:LaB6, with its B6 octahedral network, requires two electrons to stabilize its structure. Among La's three valence electrons, one remains abundant, allowing LaB6 to act as a metallic conductor. The surface plasmon resonance absorption of LaB6 nanomaterial is around 1000nm, compensating for the limitations of infrared blocking materials like ITO (indium tin oxide) in the near-infrared region. This makes LaB6 a pivotal infrared blocking material. The strong covalent bonds between B atoms create a tight spatial network, endowing LaB6 with low volatility, low work function, high melting point, high strength, and exceptional stability. Consequently, it is a crucial material for field emission, widely utilized in advanced instruments like electron microscope filaments. Its density is 4.7g/cm^3. Among the various B-La compounds, such as LaB2 and LaB4, LaB6 is the most stable.Lanthanum HexaboridSputtering Target;Purity: 99.9%;Production Method: Cold Press Sintering;Available Dimensions:Circular Target: Diameter = 3 mm;Rectangular Target: Length = 3 mm;Rotary Target: L 4000 x Wall Thickness 15mm;Minimal Order Quantity: 1 Piece;Type of Bonding: Indium, Elastomer;Application Field: Thin-film Photovoltaic Industry, LOW-E Glass Industry, Decorative & Tools Coating IndustryOther Related Targets: Aluminum Oxide (Al2O3) Sputtering TargetAluminum Zinc Oxide (AZO) Sputtering TargetIndium Oxide (In2O3) Sputtering TargetIndium Tin Oxide (ITO) Sputtering TargetZinc Oxide (ZnO) Sputtering TargetTin Oxide (SnO2) Sputtering TargetTantalum Oxide (Ta2O5) Sputtering TargetNiobium Oxide (Nb2O5) Sputtering TargetRelated Sputtering MaterialsZnO Sputtering TargetTiO2 Sputtering TargetMnO2 Sputtering TargetTiN Sputtering TargetSi3N4 Sputtering TargetAl2O3 Sputtering TargetSiC Sputtering TargetCo2O3 Sputtering TargetAlN Sputtering TargetITO Sputtering TargetVO2 Sputtering TargetSiO2 Sputtering TargetFe2O3 Sputtering TargetMgO Sputtering TargetSnO2 Sputtering TargetCuO Sputtering TargetDiscover the exceptional quality of our NiO sputtering target, designed for high-performance applications and unparalleled results.Experience top-tier efficiency with our MoO3 sputtering target, crafted for optimal performance in advanced material processes.Elevate your projects with our premium WO3 sputtering target, engineered for superior reliability and consistency.Unlock the potential of your applications with our high-grade LiFePO4 sputtering target, ensuring excellence in every use.Choose our ZnS sputtering target for exceptional quality and outstanding performance in your advanced material needs.Discover the high-quality Bi2Te3 sputtering target, designed to deliver superior performance in specialized applications.Achieve unparalleled results with our Ga2O3 sputtering target, meticulously crafted for high-precision applications.Rely on our In2O3 sputtering target for exceptional quality, tailored for cutting-edge material science applications.Choose our Ta2O5 sputtering target for top-notch performance and reliability in your advanced material processes.Opt for our Nb2O5 sputtering target, designed to provide exceptional quality and performance in specialized applications.Product ParametersSuperior Lanthanum Hexaborid Sputtering Target/ LaB6 Ceramic Targets – Certificate of Analysis (COA)Innovative Application Areas:1. Enhance and sustain the surface properties of materials, ensuring improved hardness, exceptional wear resistance, and superior corrosion resistance.2. Essential in the development of cutting-edge materials or the enhancement of existing ones, including solar cells, advanced LEDs, and state-of-the-art flat panel displays.3. Integral to the creation of electronic components like transistors and sophisticated integrated circuits.4. Crucial for producing high-performance superconductors, advanced optical films, sensitive sensors, and a variety of other specialized materials.Explore Our Related High-Quality Products:Ceramic TargetsOxideAI203, ZnO, ITO, MoO3, WO3, NiO, CeO2, In203, Ga203, etc.SulfideCuS, SnS, ZnS, WS2, MoS2, FeS, Sb2S3, etc.NitrideAIN, TIN, Si3N4, NbN, TaN, BN, etc.CarbideB4C, SiC, WC, TIC, TaC, etc.FluorideYbF3, MgF2, CaF2, LiF, AIF3, etc.OthersLaB6, MgB2, Sb2Te3, etc. Alloy TagetsNickel BasedNiV, NiFe, NiTi, NiCo, NiAl, NiCu, NiCrSi, NiCuTi, NiCuMn, NiCrCo, NiCoFeTi,etcIron BasedFeCo, FeNi, FeCoTaZr, FeMn, FeSi, FeCr, FeHf,etcCobalt BasedCoTaZr,CoCr, CoCu, CoCrW, CoCrMo.CoCrNiMo.etcCopper BasedCuGa, CuNi, CuAl, CuTi, CulnGa, CuNiTi, SnAgCu,etcAluminum BasedAlTi, AlCr, AlCrSi, AlCu, AlSi, AlSiCu, AlSnCu, etcOther AlloyWTi, ZnAl, ZnSn Metal TargetsHigh purity metalNi, Ti, Co, Cu, Fe, Al, Sn, Zn, Mg, In, Ge, Si, Bi, Zn, V, etc ;Rare earth metalSc, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu,etcRefractory metalHf, Zr, Ta, Nb, w, Mo,etcPrecious metalIr, Ru, Pd, Os, etcCompany ProfileFactory:Founded in 2014, Changsha XinKang Advanced Materials Co., Ltd is a premier factory specializing in the research, development, production, processing, sales, and service of high-quality metal materials. Our extensive product range includes metal elements, alloys, metal sputtering targets, alloy targets, ceramic targets, evaporation materials, metal powder, alloy powder, and other customized metal items. We adhere to the stringent standards of GB/T, ASTM/B, ASME SB, AMS, DIN, JIS, and custom requirements from our clients, ensuring top-notch quality across all our offerings. These products find wide applications in industries such as petrochemical, aerospace, aviation, shipbuilding, energy, medical, military, electronics, environmental protection, machinery, instrumentation, metallurgy, and automotive. Our state-of-the-art factory, spanning 4000 square meters, is situated in Changsha, Hunan, and is certified with ISO9001:2015 and ISO14001:2015 management systems. Equipped with cutting-edge technology and a highly skilled team of technicians, we employ advanced testing instruments including carbon sulfur analyzers, spectrometers, flaw detectors, cupping machines, and stiffness testers to ensure superior product quality. Our commitment to excellence, competitive pricing, timely delivery, and unparalleled after-sales service have earned us a loyal customer base across the USA, Europe, the Middle East, Japan, Korea, Singapore, India, and Kenya. Join us in experiencing the finest in metal materials and services.CertificationsFactory and EquippmentsPackaging & ShippingFAQ
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