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China, Chinese Advanced Pecvd Equipment for High-Quality Thin Film Deposition1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Laboratory InstrumentsLaboratory Heating EquipmentCVD Pecvd HpcvdChemical Vapor Deposition Equipment
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Equipment IntroductionThe RJ150-XK is a tubular diffusion/oxidation furnace designed for R&D applications in enterprises, universities, and research institutes. It supports a variety of processes including:Polysilicon and silicon nitride depositionDiffusionOxidationAnnealingKey Features:Versatile processing for advanced material researchPrecision temperature control for consistent resultsCompact design optimized for lab environmentsProduct Features: 1. Capable of accommodating processes such as polysilicon, silicon nitride, diffusion, oxidation, annealing, and more. 2. Utilizes a highly reliable industrial computer + PLC system to achieve fully automated control over furnace temperature, boat movement, gas flow, and valves, enabling complete automation of the entire process. 3. Features a user-friendly human-machine interface, allowing easy modification of process control parameters and real-time display of various process statuses. 4. Offers multiple process pipelines for convenient user selection. 5. Equipped with powerful software functionality, including self-diagnostic tools to significantly reduce maintenance time. 6. Automatic adjustment of the constant temperature zone and cascade control ensure precise regulation of the actual process temperature in the reaction tube. 7. Includes alarms and protective functions for over-temperature, thermocouple breakage, thermocouple short circuits, and deviations in process gas flow. 8. Customizable products available based on customer requirements.Technical SpecificationsModelKJ150-XKOperating Temperature≤1300oCWafer Size2~8 inches (round wafers)Number of Process Tubes1~2 tubes per unitConstant Temperature Zone Length300~600mmConstant Temperature Zone Accuracy≤±0.5oCTemperature Stability≤±0.5oC/24hTemperature Ramp RateMax heating rate: 10oC/min, Max cooling rate: 5oC/minSafety Alarms & ProtectionsOver-temperature, thermocouple breakage, thermocouple short circuit, and process gas flow deviation alarms and protection functionsThe **RJ-1200T-V50** is a **vertical fluidized bed CVD system** specifically designed for **powder surface deposition experiments**. The furnace features an **openable design**-after the experiment, the furnace body can be opened to remove the quartz tube and retrieve the processed particles. Inside the furnace tube, a **0.2mm porous quartz plate** (with customizable pore size) is installed. The powder is placed on this porous plate, and gas is introduced from the **bottom of the tube**. As the gas flows through the porous plate, it **fluidizes the sample particles**, suspending them in the heating zone for deposition. **Note:** When fluidizing the particles, excessive gas flow may cause them to **escape the heating zone**. Therefore, the gas flow rate should be adjusted according to the **particle size** during experiments.Technical SpecificationsParameterSpecificationHeating Zone Length400mmFurnace Tube DimensionsDiameter: 50mm, Length: 900mmFurnace Tube MaterialHigh-purity quartz tube with built-in 0.2mm porous quartz plate (customizable)Operating Temperature≤1100°CMaximum Temperature1200°CTemperature SensorType N thermocoupleTemperature ControlIntelligent 30-segment PID programmable microcomputer control with auto-tuningTemperature Accuracy±1°CTemperature ProtectionOver-temperature and thermocouple breakage protectionHeating Rate0-20°C/minHeating ElementAlloy resistance wireOperating VoltageAC220V, single-phase, 50HzMaximum Power3KWFurnace Chamber MaterialPolycrystalline fiber lining with excellent insulation, high reflectivity, and uniform temperature distributionFlangeStainless steel vacuum flange, easy to disassembleSealing SystemO-ring compression seal between furnace tube and flange, reusable, high airtightnessFluidization Zone1. Reaction gas uniformly passes through the reaction zone.2. Solid particles are fluidized by gas in the heating zone.3. Openable furnace design allows easy removal of quartz tube and processed particles after experiments.NoteExcessive gas flow may cause particles to escape the heating zone. Adjust gas flow according to particle size.Shell StructureDouble-layer shell with air-cooling system, openable designFurnace StructureVertical structureParameterSpecificationInternal Temperature≤45oCMeasurement & Control Devices NameDual-channel Mass Flow Controller (MFC)Gas Channels2 channelsFlow ControlDigital display, each gas line with independent needle valve controlConnection MethodDouble ferrule fittingFlow MeterMass flow meterFlow RangeMFC1: N 0-10 SLMMFC2: CO 0-10 SLMGas MixingEquipped with a precision gas mixing chamberPower Supply220V, 50HzOperating Ambient Temp.5oC~45oCStandard AccessoriesMain unit ×1, high-seal flanges ×1 pair, quartz tube ×1, sealing rings ×4,high-temperature gloves ×1 pair, crucible hook ×1,hex wrench for flange disassembly ×1, warranty card & manual ×1 setEquipment IntroductionThe vertical dual-zone CVD system primarily consists of:A 1200°C dual-zone tube furnaceA 3-channel mass flow controller (MFC) gas supply systemA 2L/s vacuum pump with related connecting componentsThe system is equipped with directional and swivel casters at the base, ensuring compact footprint and flexible mobility.Designed for CVD processes, this system is ideal for universities, research centers, and industrial manufacturers conducting experiments and production involving chemical vapor deposition.(Note: Structured for clarity while maintaining technical accuracy and natural English flow.)Fluidized Bed Tube Furnace SpecificationsParameterSpecificationMaximum Temperature1200°COperating Temperature≤1100°CDisplayLCD touch screenTube Diameter40mm (OD)Tube MaterialCustom high-purity quartz tubeFurnace Tube LengthApprox. 1100mm (customizable)Heating ElementPremium heating wireHeating Rate0-10°C/minTemperature Control- Programmable 30-segment time-temperature curves- Touchscreen multi-segment PID control- Data logging with Excel export capability- Built-in over-temperature and thermocouple failure protectionThermocoupleType N thermocoupleSealing MethodCustom stainless steel vacuum flange with sealingFurnace Chamber- Double-layer steel shell with dual cooling fans- Dual-zone vertical open structure for easy tube access- Alumina refractory fiber lining for energy efficiencyVacuum FlangeStainless steel vacuum flange with valveOperating Voltage220V, 50HzPower Rating6KW (customizable)Gas Delivery System: 3-Channel Mass Flow Control SystemParameterSpecificationPower Supply220V/50Hz, maximum output 18WKey Features:Advanced touchscreen control with data recordingDual-zone vertical design for optimal thermal managementComplete gas flow control system includedSafety-focused design with multiple protection featuresCustomizable components for specific research needsNote: Specifications may be customized based on actual requirements. The system combines precision temperature control with efficient gas delivery for advanced CVD applications.ParameterSpecificationMaximum Pressure3×10 PaGas ChannelsCan simultaneously connect 3 gas sources to slightly positive pressureFlow MeterMass flow meter (other ranges optional)Channel A Range1 SLMChannel B Range1 SLMChannel C Range1 SLMGas Line Pressure-0.1 ~ 0.15 MPaAccuracy±1% F.S.Shut-off ValveStainless steelGas Line Tubing1/4" stainless steel tubeVacuum System ComponentsComponentSpecificationVacuum Pump2L/s vacuum pump with silicone hose for rapid gas exchange in furnace tubeVacuum GaugeIncluded (standard configuration)Primary Application:This dual-zone sliding-track CVD tube furnace features a rail-guided sliding design, allowing for rapid heating and cooling of materials by horizontally moving the furnace. It can simultaneously connect six gas sources, with precise flow measurement and control via a touchscreen 6-channel mass flow controller (MFC).This high-temperature CVD system is primarily designed for universities, research institutions, and industrial manufacturers to conduct experiments and production related to chemical vapor deposition (CVD).Key Features:Sliding-track mechanism for fast thermal cyclingMulti-gas compatibility (6 independent channels)Precision flow control with touchscreen MFC interfaceVersatile applications in research and small-batch production ParameterSpecificationFurnace Access ModeSwing-open designFurnace MovementRail-guided horizontal sliding for rapid heating/coolingChamber MaterialAlumina refractory fiberHeating ElementAluminum-containing heating wireMaximum Temperature1200°COperating Temperature≤1100°CHeating Rate≤20°C/min (Recommended: 15°C/min)Heating ZonesDual-zoneTotal Zone Length200mm + 200mmTube MaterialHigh-purity quartzTube Diameter60mmSealing Method- Quick-release flange for material loading- Stainless steel vacuum flange with silicone sealControl SystemMulti-segment intelligent PID programmingTemperature SensorType N thermocoupleSafety AlarmsOver-temperature & thermocouple failure alarmsPower Supply220V, 50HzGas Delivery System (KJ-6Z)ParameterSpecificationOperating Temperature5~45°CMaximum Pressure3×10 PaGas Channels6 independent gas inputsFlow Meter TypeMass flow meter (other ranges available at same cost)Channel A Range0-300 SCCMChannel B Range0-300 SCCMChannel C Range0-300 SCCMChannel D Range0-300 SCCMChannel E Range0-300 SCCMChannel F Range0-300 SCCMLine Pressure-0.1~0.15 MPaValvesStainless steel shut-off valvesTubingStainless steelVacuum SystemComponentSpecificationPump SystemMolecular pump unit with connecting pipesPower220V/50HzMobilityWheel-mounted base for easy movementUltimate Vacuum6.67×103 PaStandard AccessoriesQuartz furnace tube (1)Vacuum flange set (1)Key Features:Unique sliding mechanism enables rapid thermal cyclingSix-channel precision gas control systemResearch-grade vacuum capabilityComplete turnkey solution with all necessary accessoriesIndustrial-grade construction with safety protections Tube stoppers (2)O-ring sealsProtective gloves (1 pair)Crucible hook (1)PTFE tubing (3m)Hex keys (2)Operation manualThis system is designed for CVD processes, including:Silicon carbide coatingConductivity testing of ceramic substrates2D material growthControlled growth of ZnO nanostructuresAtmosphere sintering of ceramic capacitors (MLCC)It also serves as a dedicated graphene film growth furnace for graphene preparation. The furnace features a sliding rail base design, allowing manual lateral movement to expose the tube to room temperature for rapid cooling.This equipment is particularly suitable for CVD experiments requiring fast heating/cooling rates, making it ideal for:High-efficiency graphene synthesisOther CVD applications demanding rapid thermal cyclingKey Advantages: Precision temperature control for sensitive material growth Unique sliding mechanism enables faster processing Versatile applications across advanced material research Optimized for both graphene and general CVD processesSliding Rail Tube Furnace SpecificationsFurnace SectionParameterSpecificationFurnace StructureSliding rail designMaximum Temperature1200°CContinuous Operating Temperature≤1100°CHeating RateUp to 20°C/min (Recommended: 10°C/min)Heating Zone Length300mm (Single zone)Heating ElementPhase-resistant heating wireThermocoupleType KTemperature Accuracy±1°CTube Diameter OptionsΦ50, Φ60, Φ80Tube MaterialHigh-purity quartzTemperature ControllerPID intelligent program controlVacuum Flange304 stainless steel- Left flange: Equipped with needle valve + ball valve- Right flange: KF25 interface with baffle valvePower Supply| Input Power | Single-phase 220V, 50Hz, 3KW |Vacuum SystemComponentSpecificationRotary Vane Pump with Digital Gauge- Ultimate vacuum: 103 Torr- Tube vacuum: 102 Torr- Pumping speed: 4CFM (2L/s, 120L/min)- Options: Rotary vane pump/diffusion pump/molecular pump availableMass Flow Controller SystemParameterSpecificationChannels3-channel high precision MFCFlow RangeMF1-MF3: 50-1000sccm adjustableFeatures- Mixing chamber at bottom- 3 manual stainless steel needle valvesImportant NotesWarningDescriptionPressure LimitTube pressure must not exceed 0.02MPaGas Cylinder SafetyMust use pressure reducer (0.01-0.1MPa recommended)High Temp OperationAbove 1000°C: Maintain atmospheric pressureGas Flow Limit<200SCCM to protect quartz tubeQuartz Tube LimitContinuous use <1100°CValve WarningNever close both valves during heatingCertifications| ISO Certification | CE Certification |Safety Precautions:Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.Warning: Failure to follow these precautions may result in:Serious personal injuryEquipment damageSafety hazards When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:Continuously monitor pressure gauge readingsImmediately open exhaust valve if absolute pressure exceeds 0.02MPaPrevents hazardous situations (tube rupture, flange ejection, etc.)Equipment Application & FeaturesThis high-temperature CVD tube furnace is designed for chemical vapor deposition (CVD) processes, including:Silicon carbide (SiC) coatingConductivity testing of ceramic substratesControlled growth of ZnO nanostructuresAtmosphere sintering of ceramic capacitors (MLCC)Primary Users:Universities, research institutions, and industrial manufacturers for vapor deposition-related experiments and production.Key Specifications:Alumina (AlO) furnace tube withstands temperatures up to 1600°CVacuum & atmosphere-capable designHeating element: High-performance MoSi (molybdenum disilicide)Furnace chamber: Ceramic fiber insulation for excellent thermal uniformity & energy efficiencyAdvantages:High temperature stability (±1°C precision)Rapid heating/cooling with superior heat retentionSafe & user-friendly operationVersatile for advanced materials researchParameterSpecificationMaximum Temperature1700°COperating Temperature1600°CDisplayLED ScreenTube Diameter80mm (OD)Tube MaterialAlumina TubeHeating Zone Length220+220+220mm (with gaps between zones)Heating ElementMoSi (Molybdenum Disilicide)Heating Rate0-5°C/minTemperature Control- PID automatic power control via SCR (Silicon Controlled Rectifier), phase-angle firing with current-limiting resistor- 30 programmable segments for ramp/soak control- Built-in PID auto-tuning with over-temperature & thermocouple failure protection- Over-temperature alarm allows unattended operationThermocouples3 control thermocouples (one per zone, outer tube) + 1 monitoring thermocouple (inner tube)Temperature Accuracy±1°CFurnace Structure- Double-layer steel shell with dual cooling fans (surface temp <60°C)- Fixed non-openable furnace designVacuum FlangeStainless steel vacuum flange with valveOperating Voltage220V 50HzMaximum Power6kWGas Delivery SystemComponentSpecification4-Channel Mass Flow Controllers- MFC1: 0-100sccm- MFC2: 0-200sccm- MFC3: 0-500sccm- MFC4: 0-200sccmGas Mixing- Bottom-mounted mixing chamber with liquid release valve- 4 manual stainless steel needle valves for gas controlVacuum SystemComponentSpecificationVacuum Pump + GaugeRotary vane pump achieves 10Pa vacuum (cooled state)Key Features:Ultra-high temperature capability (1700°C) with MoSi heating elementsPrecision multi-zone temperature control (±1°C)Programmable 30-segment thermal profilesComplete gas mixing system with 4-channel MFCsIndustrial-grade vacuum performance Safety Precautions:Do not open the furnace chamber when temperature ≥200°C to prevent personal injury.Tube pressure must never exceed 0.02MPa (absolute pressure) during operation to avoid equipment damage from overpressure.Warning: Failure to follow these precautions may result in:Serious personal injuryEquipment damageSafety hazards When furnace temperature >1000°C, the tube must not be under vacuum - maintain atmospheric pressure inside the tube.Avoid closing both inlet and outlet valves simultaneously during sample heating. If valves must be closed:Continuously monitor pressure gauge readingsImmediately open exhaust valve if absolute pressure exceeds 0.02MPaPrevents hazardous situations (tube rupture, flange ejection, etc.)Equipment DescriptionThis system integrates:Gas flow control systemLiquid injection systemMulti-stage temperature-controlled growth zonesWater cooling systemCNT Growth Furnace Specifications:Maximum operating temperature: 1400°C (continuously adjustable from 0-1400°C)Vertical thermal field distribution with dual-zone temperature controlTop-mounted liquid injection port with flow guide componentsThis CNT/thin-film CVD equipment enables: Continuous, uninterrupted growth processes Precise thermal management for controlled nanostructure synthesis Integrated liquid/gas phase delivery for complex material depositionCarbon nanotube (CNT) synthesis componentsTechnical Specifications - Carbon Nanotube/Nanowire CVD Growth FurnaceParameterSpecificationEquipment NameCarbon Nanotube/Nanowire CVD Growth FurnaceModelKJ-T1400VFurnace StructureDouble-layer shell with air cooling system (surface temp <60°C), inner wall coated with imported alumina coating for high reflectivity and cleanlinessMaximum Power20KWVoltageAC 220V single-phase, 50/60HzHeating ElementSilicon carbide (SiC) rodsMax Operating Temp1400°CContinuous Working TempAdjustable between 100-1400°CHeating Rate1-10°C/minFurnace Tube Material & DimensionsAlumina tube: OD 80mm × Length 1500mmHeating Zone Length700mm + 400mmUniform Temp Zone Length800mm (±1°C)ThermocoupleSEI thermocouple for temperature measurement and controlTemperature Control System30-segment PID programmable controlTemperature Accuracy±1°CStainless Steel FlangeThe system includes a stainless steel vacuum flange assembly (equipped with stainless steel needle valves and mechanical pressure gauge). The armored flange allows thermocouple extension to the inlet for temperature monitoring.Key Features:High-purity alumina tube for contamination-free growthPrecision temperature control (±1°C) across 800mm uniform zoneNote: All specifications subject to technical verification. Designed for advanced nanomaterial synthesis under controlled atmospheres.Robust SiC heating elements for ultra-high temperature operationComplete gas/vacuum interface with measurement capabilitiesEquipment IntroductionThe LCD Touchscreen CVD High-Temperature Furnace is a tube furnace specially designed for CVD processes, featuring:Double-layer shell structure with an air-cooling system, keeping the surface temperature below 55°C30-segment PID programmable intelligent temperature control with phase-angle firing for precise heatingAlumina polycrystalline fiber chamber lining for excellent thermal insulation and uniform temperature distributionApplications: Silicon carbide (SiC) coating Conductivity testing of ceramic substrates Controlled growth of ZnO nanostructures Atmosphere sintering of ceramic capacitors (MLCC)Key Advantages:User-friendly touchscreen interfaceEnergy-efficient thermal designResearch-grade temperature uniformityVersatile for advanced material processing Fully automated operation with unattended capabilityHigh-Temperature Furnace SpecificationsParameterSpecificationFurnace StructureDouble-layer shell with air cooling system (surface temp <55°C), inner wall coated with imported alumina coating for enhanced reflectivity and cleanlinessMaximum Power5KWVoltageAC 220V single-phase, 50HzHeating ElementAl-doped Fe-Cr-Al alloy (alumina-coated surface for extended lifespan)Max Operating Temp1200°CContinuous Working Temp1100°CHeating Rate1-10°C/minFurnace Tube Material & DimensionsQuartz tube: OD 80mm × Length 1000mmHeating Zone LengthTotal 440mmUniform Temp Zone Length150mm (±1°C)Control InterfaceLCD touch screenThermocoupleType N thermocouple, 3 calibrated thermocouples with real-time display on furnace screenTemperature Control30-segment PID programmable controlTemperature Accuracy±1°CVacuum Sealing SystemTwo stainless steel vacuum flanges (pre-installed with vacuum gauge and shut-off valve)High Vacuum System- Control panel for molecular pump speed/vacuum level monitoring- Turbo molecular pump + dry scroll pump- All KF-25 standard connections between pumps and quartz tubeVacuum Level6.7×103 Pa (empty chamber, room temperature)Gas Delivery SystemThree mass flow controllers with ranges:? Channel 1: 1-100 sccm? Channel 2: 1-200 sccm? Channel 3: 1-500 sccmKey Features:Ultra-clean alumina-coated chamber for contamination-sensitive processesPrecision 3-zone temperature monitoring (±1°C)Research-grade vacuum capability down to 103 PaComplete gas flow control with triple MFC channelsIndustrial-grade components with extended durability
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