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China, Chinese High Vacuum Magnetron Sputtering Coating Equipment for Conductive and Optical Films1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Metallic Processing MachineryCoating MachinePowder Coating
HENAN RUNJING INSTRUMENT EQUIPMENT CO.,LTD
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Product Description Desktop Dual-Target Magnetron Sputtering System(Modular Co-Sputtering System for Advanced Thin-Film Deposition) Key SpecificationsComponentParametersSample Stage- Diameter: 100-150mm- Heating: ≤500°C (±1°C)- Rotation: 1-20 rpm adjustableMagnetron Targets- Quantity: 2× 2-inch- Cooling: Water-cooled (10L/min flow rate)Vacuum Chamber- Dimensions: Φ219mm × 280mm (stainless steel)- Viewport: φ40mm quartz window- Loading: Front/top-opening design with rotatable shutter for target switchingPower Supply- DC + RF: 1×300W (max), ≤600V, response time <5msCooling System- Water tank: 9L capacity, 10L/min flow rateThickness Monitor- Accuracy: 0.1? (optional, water-cooled)Vacuum Pump- Primary: Rotary vane pump (1.1L/s)- Secondary: Turbo molecular pump (60L/s, import-grade)- Ports: KF40 (inlet), KF16 (outlet)General- Power: AC 220V, 50Hz, 4.5kW total FeaturesMulti-Layer DepositionDual-target co-sputtering with mechanical shutter for sequential/pulsed deposition.Heated rotating stage ensures film uniformity (e.g., for alloy/oxide stacks).High-Vacuum PerformanceStainless steel chamber (base pressure <10<sup>-5</sup> Pa with recommended pump).Compact import-grade turbo pump minimizes footprint while maintaining 60L/s speed.Process ControlOptional real-time thickness monitoring (0.1? resolution).Front-loading design with quartz window for in-situ observation. ApplicationsElectronics: Conductive/metallic films (e.g., Au, Al, Cu).Optics: Anti-reflection/IR coatings.Research: Multilayer SEM samples, ceramic thin films (with RF power). Technical NotesPump Not Included - Compatible with imported turbo molecular pumps (e.g., Pfeiffer HiPace 80).Upgradable: Add pulsed DC or additional RF power for reactive sputtering. Why Choose This System? Space-Saving: Desktop design (optimized for labs with limited space). Flexible Deposition: Switch targets without breaking vacuum. Industrial-Grade Precision: ±1°C temperature control, fast pump-down.For OEM configurations (e.g., 4-target systems), contact our engineering team. *Note: All specifications comply with ISO 9001. Custom gas manifolds (e.g., 4-channel MFC) available upon request.*
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