IPDB › China Industry › Metallurgy, Mineral & Energy › Target Material
China, Chinese Semiconductor Grade Tantalum Nitride Sputtering Target Tan Thin Film Material1 Industrial Products Supplier Manufacturer Details, price list catalog:
China Industrial Products Supplier Manufacturer List Catalog
Target MaterialTantalum Nitride Sputtering TargetHigh Purity Tantalum Nitride Target
Changsha Xinkang Advanced Materials Co., Ltd.
Preview:
Product Description Product Name:High Purity Tantalum Nitride Sputtering Target TaNCategory:Target MaterialKeywords:Tantalum nitride target, Sputtering target, Thin film deposition, PVD coating material, Semiconductor industry, High purity material, Ceramic target material, Vacuum deposition, Thin film technology, Physical vapor depositionDescription:Elevate your thin film technology with our High Purity Tantalum Nitride Sputtering Target. Specifically designed for the semiconductor industry, this ceramic target material is ideal for PVD coating applications. Featuring an exceptional high purity composition, our tantalum nitride target guarantees superior performance in vacuum deposition processes. Achieve precise, uniform, and reliable thin film deposition with confidence, thanks to the outstanding quality of this sputtering target. Enhance the efficiency, productivity, and effectiveness of your PVD coating operations with our tantalum nitride sputtering target. Commit to excellence and invest in top-tier solutions for your thin film technology requirements.
Purchasing Request
Note: Send your purchase request, and we will screen suppliers or manufacturers for you free of charge...