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China, Chinese Mno2 Ceramic Sputtering Material Industrial Products Supplier Manufacturer Details, price list catalog:

China Industrial Products Supplier Manufacturer List Catalog

1.Ceramic Sputtering Target Manganese Oxide Mno2 Sputtering Target Ceramic Material Other Ceramic Material Mno2 Ceramic Sputtering MaterialCeramic Mno2 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	8024 byte

2.99.9% Mno2 Sputtering Target Pure Mno2 Target for Sputtering Target Material Mno2 Target Mno2 Disk Changsha Xinkang Advanced Materials Co., Ltd.	3871 byte

3.PVD Target 99.9% Mno2 Target Manganese Oxide Sputtering Target Target Material Mno2 Sputtering Target Mno2 Target Changsha Xinkang Advanced Materials Co., Ltd.	1589 byte

4.99.5% Tin Ceramic Sputtering Targets for Optical Thin Film Deposition Coating Ceramic Material Other Ceramic Material Titanium Nitride Sputtering Targets Ceramic Sputtering Target Supplier Changsha Xinkang Advanced Materials Co., Ltd.	5664 byte

5.Mno2 40% 50% 60% Pyrolusite Manganese Dioxide Granules / Sand Filter Media Price Nonmetallic Minerals Sand Mno2 40%Mno2 50% Zhengzhou Shanjie District Qianjiaxin New Material Firm	4549 byte

6.SiO2 Sputtering Ceramic Target Silicon Oxide Sputtering Ceramic Target for PVD Film Coating Target Material Sputtering Target SiO2 Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3221 byte

7.High Purity 99.9% Fes Ceramic Sputtering Target for Thin Film Deposition Ceramic Material Other Ceramic Material Fes Sputtering Target Iron Sulfide Ceramic Target Changsha Xinkang Advanced Materials Co., Ltd.	6523 byte

8.High Purity Sns Ceramic Sputtering Target for Thin Film Deposition Ceramic Material Other Ceramic Material Sns Ceramic Target Tin Sulfide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	6784 byte

9.B4C Sputtering Ceramic Sputtering Target for Film Coating Target Material Sputtering Target B4C Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3201 byte

10.High Performance 99.5% Silicon Carbide Ceramic Sputtering Target for Precision Coating Applications Ceramic Material Other Ceramic Material Silicon Carbide Sputtering Target Silicon Nitride Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	5445 byte

11.Premium Ceramic Mno3 Sputtering Targets for Optical Coatings Ceramic Material Other Ceramic Material High-Quality Optical Targets Ceramic Sputtering Targets Changsha Xinkang Advanced Materials Co., Ltd.	5539 byte

12.Factory Supply Pyrolusite Granules Mno2 Min 82% Powder Manganese Dioxide with Wholesale Price Nonmetallic Minerals Sand Pyrolusite Granules Mno2 Pyrolusite Granules Mno2 82% Powder Zhengzhou Shanjie District Qianjiaxin New Material Firm	4549 byte

13.h-BN Sputtering Ceramic Target for Film Coating Target Material Sputtering Target h-BN Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3213 byte

14.High Purity Ta2o5 Sputtering Target Disc Ceramic Material Metal Ceramics Tantalum Oxide Sputtering Target Ceramic Ta2o5 Sputtering Disc Changsha Xinkang Advanced Materials Co., Ltd.	3996 byte

15.High Purity Tin Ceramic Sputtering Material for Optical Coating Applications Target Material High Purity Material Ceramic Sputtering Material Changsha Xinkang Advanced Materials Co., Ltd.	4677 byte

16.Nickel Oxide Sputtering Target 99.99% Nioceramic Targets for Coating Ceramic Material Other Ceramic Material Nickel Oxide Sputtering Target Nio Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	6821 byte

17.Nickel Oxide Sputtering Target Nio Ceramic for High Purity Thin Film Coating Ceramic Material Other Ceramic Material Ceramic Thin Film Coating PVD Sputtering Materials Changsha Xinkang Advanced Materials Co., Ltd.	7330 byte

18.Si3N4 Sputtering Ceramic Target for Film Coating Target Material Sputtering Target Si3N4 Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3234 byte

19.99.5% Ceramic Targets Si3N4 Sputtering Target Bonding Copper Backing Plate for Optical Coating Ceramic Material Other Ceramic Material Silicon Nitride Target Silicon Nitride Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4633 byte

20.Silicon Dioxide Ceramic Target for High Precision Sputtering Ceramic Material 99.99% Sio2 Ceramic Target Silicon Dioxide Sputtering Material Changsha Xinkang Advanced Materials Co., Ltd.	7113 byte

21.Ceramic Sputtering Target Lithium Niobate Linbo3 Sputtering Target Target Material Ceramic Sputtering Target Lithium Niobate Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	1521 byte

22.Customized Size Ceramic Sputtering Target Target Material Ceramic Sputtering Target Custom Size Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3845 byte

23.Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target Evaporation Material Aluminium Oxide Ceramic Sputtering Target High Density Ceramic Target Changsha Xinkang Advanced Materials Co., Ltd.	7848 byte

24.Customized Al2O3 Ceramic Sputtering Target Alumina Aluminum Oxide Round Target Evaporation Material Aluminium Oxide Ceramic Sputtering Target High Density Ceramic Target Changsha Xinkang Advanced Materials Co., Ltd.	7848 byte

25.Xinkang 99.99% ITO Sputtering Target In2o3/Sno2 90/10wt% Ceramic Target for Sputtering Target Material Ceramic Target ITO Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4010 byte

26.99.99% Bismuth Ferrite Sputtering Target Bifeo3 Ceramic Coating for Vacuum Forming Ceramic Material Other Ceramic Material Bismuth Ferrite Sputtering Target High Purity Bismuth Ferrite Changsha Xinkang Advanced Materials Co., Ltd.	7338 byte

27.99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research Ceramic Material Zirconia Ceramics Aluminum Nitride Sputtering Target Aluminum Nitride Sputtering Changsha Xinkang Advanced Materials Co., Ltd.	3985 byte

28.High Purity In2o3 Ceramic Sputtering Target Target Material In2o3 Ceramic Sputtering Target 99.99% In2o3 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3011 byte

29.Factory Supply Ceramic Nb2o5 Sputtering Target Material with 99.99% Purity Target Material Niobium Pentoxide Ceramic Target Sputtering Target Niobium Oxide Changsha Xinkang Advanced Materials Co., Ltd.	5185 byte

30.TiN Sputtering Ceramic Target for Optical Thin Film Coating/PVD Film Coating Target Material Sputtering Target TiN Sputtering Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3211 byte

31.In2O3 Target Indium Oxide Ceramic Sputtering Target for LCD/Touch Panel Target Material Sputtering Target Indium Oxide Ceramic Sputtering Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3253 byte

32.Lanthanum Hexaboride Lab6 Ceramic Disc Sputtering Target Ceramic Material Other Ceramic Material Lab6 Disc Lab6 Sputtering Target Xiamen Wintrustek Advanced Materials Co., Ltd.	3780 byte

33.High Purity Molybdenum Boride (MoB) Sputtering Target for Coating Applications Ceramic Material Other Ceramic Material Molybdenum Boride Sputtering Target Mob Target Material Changsha Xinkang Advanced Materials Co., Ltd.	6476 byte

34.Custom Size MOS2 Ceramic Target Material Target Material MOS2 Sputtering Target Material Ceramic Sputtering Target Material Changsha Xinkang Advanced Materials Co., Ltd.	4909 byte

35.High Purity Silicon Dioxide Ceramic Target for Sputtering Processes Ceramic Material Zirconia Ceramics 99.99% Sio2 Ceramic Target Sputtering Silicon Dioxide Target Changsha Xinkang Advanced Materials Co., Ltd.	7422 byte

36.High Pure 99.99% Alumina/Al2O3 Ceramic Sputtering Targets Target Material Alumina Sputtering Target Aluminium Oxide Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	286 byte

37.99.9% Pure Aluminum Nitride Sputtering Target Aln Planar Ceramic Target for Scientific Research Ceramic Material Aluminum Nitride Sputtering Target Aluminum Nitride Sputtering Changsha Xinkang Advanced Materials Co., Ltd.	3985 byte

38.TeO Sputtering Target Telluride Oxide Ceramic Target for Semiconductor Target Material Sputtering Target TeO Sputtering Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3271 byte

39.99.99% Pure Indium Tin Oxide ITO Ceramic Sputtering Target for PVD Coating Target Material Ceramic Target ITO Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	3978 byte

40.99.9% Linbo3 Lithium Niobate Sputtering Target for Precision Optical Coating Ceramic Material Other Ceramic Material Advanced Silicon Carbide Target Linbo3 Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4500 byte

41.Lanthanum Titanate Sputtering Target Latio3 Ceramic Targets for Optical Coating Ceramic Material Other Ceramic Material Latio3 Target Lanthanum Titanate Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4501 byte

42.PZT Ceramic Sputtering Target for Integrated Circuits Chips Target Material Sputtering Target PZT Ceramic Target SUZHOU TECHNO-TEC PHOTOELECTRIC MATERIALS CO., LTD	3182 byte

43.99.5% Hexagonal Boron Nitride Bn Sputtering Target for Vacuum Thin Film Coating Ceramic Material Other Ceramic Material Bn Sputtering Target Boron Nitride Target Changsha Xinkang Advanced Materials Co., Ltd.	6150 byte

44.Support OEM MOS2 Ceramic Sputtering Target Target Material MOS2 Ceramic Sputtering Target Molybdenum Disulfide Target Material Changsha Xinkang Advanced Materials Co., Ltd.	5032 byte

45.High Purity Iron Carbide (Fe3C) Sputtering Target for Thin Film Deposition Ceramic Material Other Ceramic Material Iron Carbide Sputtering Target Fe3c Target Material Changsha Xinkang Advanced Materials Co., Ltd.	6529 byte

46.99.9% 99.99% Barium Titanate Ceramic Sputtering Target Batio3 Disc Targets Ceramic Material Other Ceramic Material Batio3 Target Barium Titanate Sputtering Target Changsha Xinkang Advanced Materials Co., Ltd.	4335 byte

47.0.6-1.2 mm Mno2 Content 60-70 Pyrolusite Sand for Water Treatment Iron Removal Nonmetallic Minerals Sand 0.6-1.2 mm Mno2 0.6-1.2 mm Pyrolusite Sand Zhengzhou Shanjie District Qianjiaxin New Material Firm	4549 byte

48.Black Tantalum Pentoxide Ceramic Targets Ta2o5 Sputtering Target for Optical Coating Ceramic Material Metal Ceramics Custom Tantalum Oxide Target Sputtering Target Manufacturer Changsha Xinkang Advanced Materials Co., Ltd.	4744 byte

49.Igh Purity Molybdenum Disilicide (MoSi2) Sputtering Target for Thin Film Coating Ceramic Material Other Ceramic Material Molybdenum Disilicide Sputtering Target Mosi2 Target Material Changsha Xinkang Advanced Materials Co., Ltd.	6478 byte

50.High-Quality Customized Tin Sulfide Sputtering Targets for Semiconductors Ceramic Material Other Ceramic Material Customized Targets Sulfide Sputtering Targets Changsha Xinkang Advanced Materials Co., Ltd.	8379 byte

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